Radiation-Sensitive Composition Using Cyano/Nitro Onium Salts
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Solution Overview
Problem
Existing radiation-sensitive compositions with reduced fluorine atom content face challenges in maintaining sensitivity, line width roughness (LWR) performance, critical dimension uniformity (CDU), mask error enhancement factor (MEEF), and storage stability, while environmental concerns necessitate a reduction in fluorine content.
Innovation Solution
A radiation-sensitive composition comprising an onium salt compound with specific structural features, including a cyano or nitro group bonded to a carbon atom adjacent to the sulfonate anion and a carbonyl group-containing bond, enhances acid generation, improving sensitivity, LWR, CDU, and MEEF performance, while maintaining storage stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If perfluoroalkylsulfonic acid is used as a photoacid generator to improve sensitivity and resolution, then sensitivity and resolution are improved, but fluorine atom content increases causing environmental concerns
Solution Approach 1:
The patent changes the chemical parameters of the photoacid generator by replacing perfluoroalkyl groups with cyano or nitro groups while maintaining the sulfonic acid functionality. This parameter change reduces fluorine content by approximately 50% compared to conventional perfluoroalkylsulfonic acid generators while preserving the strong acid-generating capability needed for high resolution and sensitivity in photolithography processes
Solution Approach 2:
The patent creates a composite photoacid generator structure combining electron-withdrawing groups (cyano or nitro) with sulfonic acid moieties. This composite approach allows the molecule to achieve both environmental compatibility (reduced fluorine) and functional performance (strong acidity for high resolution patterning) through synergistic structural design
2Object-affected harmful factors
If fluorine atom content is reduced to address environmental concerns, then environmental impact is reduced, but sensitivity, LWR performance, CDU, and MEEF performance deteriorate
Solution Approach 1:
The patent modifies the molecular parameters by introducing cyano or nitro groups at specific positions adjacent to the sulfonate anion. These parameter changes maintain the electron-withdrawing capability necessary for generating strong acid, thereby preserving LWR performance and other critical metrics while achieving reduced fluorine content
Solution Approach 2:
The patent adopts alternative chemical structures (cyano/nitro-sulfonic acid compounds) that are environmentally more sustainable replacements for conventional perfluorinated compounds. These alternative structures provide comparable or superior performance while being more environmentally benign, effectively replacing harmful substances with safer alternatives
3Object-affected harmful factors
If fluorine atom content is reduced to address environmental concerns, then environmental impact is reduced, but storage stability deteriorates
Solution Approach 1:
The patent designs a composite molecular structure where cyano or nitro groups are strategically positioned adjacent to the sulfonate anion. This structural design creates a stable electronic configuration that maintains storage stability comparable to conventional perfluorinated compounds while eliminating the environmental persistence associated with fluorinated substances
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high-quality resist patterns with excellent sensitivity, LWR, CDU, and MEEF performance, along with improved storage stability and reduced environmental impact.
Implementation Method 1
a resist pattern is formed on a substrate by generating an acid by irradiating the coating of the resist composition with a radioactive ray through a mask pattern
Implementation Method 2
reacting in the presence of the acid as a catalyst to generate the difference of solubility of a polymer into an alkaline or organic developer between an exposed part and a non-exposed part
Data Source
AI summary
A radiation-sensitive composition includes: an onium salt compound represented by formula (1), a polymer including a structural unit which includes an acid-dissociable group, and a solvent. A is a monovalent organic group having 1 to 40 carbon atoms; R1 and R2 are each independently a hydrogen atom, a cyano group, a nitro group, a hydroxy group, an alkoxy group, an alkylthio group, or the like, at least one of R1 and R2 is a cyano group or a nitro group; m1 is an integer of 1 to 8; L is *—COO—, *—OCO—, *—CO—, or *—OCOO—, * is a bond on a group A side, provided that when m1 is 1, L is *—COO—, *—CO—, or *—OCOO—; and Z+ is a monovalent radiation-sensitive onium cation.