Cylindrical Fin Gate Structure With Single-Contact Bridge

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Related art cylindrical field effect transistors require separate contacts for inner and outer gates, which is inefficient and costly.

Innovation Solution

A semiconductor device with a cylindrical fin structure featuring a recess that connects inner and outer gates through a conductor, eliminating the need for separate contacts by forming a continuous bridge between the gates using the same metal layer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If separate contacts are used for inner and outer gates in related art cylindrical FETs, then each gate can be independently controlled, but the device complexity and manufacturing cost increase

Engineering Contradiction:
Improveindependent gate controlVSAvoidnumber of contacts
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The patent merges the inner and outer gates into a single integrated gate structure, eliminating the need for separate contacts. The gate is formed as one continuous component that provides independent control regions through internal segmentation rather than requiring separate external contacts, thus reducing device complexity while maintaining operational independence.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The single gate structure serves multiple functions by providing both inner and outer gate control regions within one component. This universal gate design allows the same structure to perform multiple control functions that previously required separate dedicated contacts, reducing the overall number of components needed.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Reliability

If separate contacts are used for inner and outer gates, then gate control is achieved, but manufacturing time and cost increase

Engineering Contradiction:
Improvegate control functionalityVSAvoidmanufacturing time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

By combining the inner and outer gates into a single manufactured component, the patent reduces the number of separate fabrication steps and assembly operations required. This merging approach maintains full gate control functionality while significantly reducing manufacturing time and associated costs.

Inventive Principle:
Principle #5Merging (Combining)

3Device complexity

If a single metal layer is used to form the conductive bridge, then material cost and process complexity are reduced, but electrical connection reliability must be maintained

Engineering Contradiction:
Improvenumber of metal layersVSAvoidelectrical connection
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The single metal layer performs multiple functions simultaneously: it forms the conductive bridge connecting the gate to the contact, provides electrical pathways for both inner and outer gate control, and serves as the interconnect structure. This multi-functional use of one material layer maintains electrical connection reliability while reducing overall device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution merges the inner and outer gates, reducing the need for separate contacts and saving time and money by using a single metal layer to form a conductive bridge between the gates, ensuring effective electrical connection.

Implementation Method 1

a conductor formed in the recess and connecting the inner and outer gates

Methodology Applied
Scientific EffectElectrical Conduction: Conduction (electrical)

Data Source

PatentUS11869937B2Semiconductor device and method of forming the semiconductor device
Publication Date: 2024.01.09 INTERNATIONAL BUSINESS MACHINE CORPORATION
  • US11869937B2 patent drawing
  • US11869937B2 patent drawing
  • US11869937B2 patent drawing

AI summary

A semiconductor device including a fin structure including a recess, a first gate formed in the recess of the fin structure, and a second gate formed outside the fin structure.