Cylindrical Lithography Mask Fabrication
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Solution Overview
Problem
Existing methods for manufacturing near-field optical lithography masks often result in macro stitching lines due to the use of multiple polymer film pieces, which can be costly and inefficient, especially when creating large-area masks.
Innovation Solution
The development of methods for fabricating near-field optical lithography masks with a cylindrical design, where a polymer layer is patterned using techniques like nanoimprint lithography, contact optical lithography, bond-detach lithography, and decal transfer lithography, allowing for continuous or step-and-rotate processing to avoid stitching lines and ensure seamless patterning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If multiple polymer film pieces are used to manufacture near-field optical lithography masks, then the mask can be created using existing manufacturing techniques, but macro stitching lines appear between the pieces reducing mask quality
Solution Approach 1:
The mask fabrication process is divided into segments corresponding to different polymer film pieces, each patterned separately and then assembled. This allows existing manufacturing techniques to be applied to each segment while maintaining overall mask functionality.
Solution Approach 2:
Multiple patterned polymer film segments are merged or assembled together to form the complete near-field optical lithography mask. This combining approach enables the creation of large-area masks that would be difficult to manufacture as single pieces while managing the stitching line issue through careful alignment and design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the creation of high-quality near-field optical lithography masks with reduced stitching lines, improving efficiency and cost-effectiveness by allowing for continuous or segmented patterning on a cylindrical surface, suitable for large-area applications.
Implementation Method 1
exposure of a photoresist layer to ultraviolet (UV) light that passes through an elastomeric phase mask while the mask is in conformal contact with a photoresist
Implementation Method 2
A phase mask is formed with a depth of relief that is designed to modulate the phase of the transmitted light by π radians
Implementation Method 3
Bringing an elastomeric phase mask into contact with a thin layer of photoresist causes the photoresist to 'wet' the surface of the contact surface of the mask
Data Source
AI summary
Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having nanometer scale features may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.