Cylindrical Magnetic Levitation Stage for Vacuum Exposure
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Solution Overview
Problem
Conventional planar-type stages face limitations in handling large-scale substrates and achieving high precision, especially in vacuum environments, due to friction in contact-type mechanical bearings and limitations of non-contact air levitation in low-vacuum environments, which hinders precise micro-pattern formation on substrates during exposure processes.
Innovation Solution
A cylindrical magnetic levitation stage employing a non-contact magnetic levitation principle, utilizing a cylindrical substrate with permanent magnet arrays and coil arrays to generate controlled magnetic forces for precise axial translation and rotation, allowing for high-precision control of micro-pattern formation on cylindrical substrates in both large-scale and vacuum environments.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a contact-type mechanical bearing is used for substrate translation in a vacuum environment, then the structure is simple and reliable, but friction occurs which limits exposure precision
Solution Approach 1:
The patent replaces the contact-type mechanical bearing system with a non-contact magnetic levitation system. The magnetic levitation stage uses magnetic fields to suspend and position the substrate without physical contact, eliminating friction entirely while maintaining vacuum environment compatibility. This substitution directly resolves the contradiction by removing the friction source that limited exposure precision while preserving vacuum operation capability.
2Manufacturing precision
If a non-contact air levitation bearing is used to eliminate friction, then exposure precision improves, but it can only be applied to low-vacuum environments
Solution Approach 1:
The patent replaces the air levitation bearing system with a magnetic levitation system that operates independently of atmospheric conditions. The magnetic field-based levitation mechanism functions effectively in high-vacuum environments where air levitation fails, thereby expanding environment adaptability while maintaining the frictionless operation needed for high exposure precision.
3Ease of manufacture
If a planar-type stage is used for conventional wafer exposure, then the structure is simple and easy to manufacture, but it encounters limitations in coping with large-scale substrates and micronization trends
Solution Approach 1:
The patent transitions from a planar substrate configuration to a cylindrical substrate configuration mounted on a cylindrical magnetic levitation stage. This curvilinear geometry enables the system to accommodate large-scale substrates and roll-to-roll processing while maintaining manufacturing feasibility through standardized cylindrical component fabrication.
4Device complexity
If contact-type mechanical bearings are used for substrate rotation, then the structure is simple, but friction occurs which limits micro-pattern formation precision
Solution Approach 1:
The patent replaces contact-type mechanical rotation bearings with a non-contact magnetic levitation rotation mechanism. The magnetic field provides frictionless rotational support for the cylindrical substrate, enabling precise micro-pattern formation while maintaining relatively simple device architecture through the integrated magnetic levitation stage design.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables high-precision control of micro-pattern formation on large-area substrates with the ability to handle large-scale substrates and operate in vacuum environments, enhancing the integration and precision of exposure apparatuses through non-contact magnetic levitation.
Implementation Method 1
employing a magnetic levitation principle that can be applied to an exposure apparatus and an exposure work to form the micro-patterns on the surface of the cylindrical substrate
Implementation Method 2
a first mover and a second mover onto which a first permanent magnet array and a second permanent magnet array are attached, respectively... with a first coil array and a second coil array interposed between the first and second permanent magnet arrays and the first and second stators
Data Source
AI summary
The present invention provides a cylindrical magnetic levitation stage which includes a cylindrical substrate used to form micro-patterns of various arbitrary shapes on a large-area semiconductor substrate or display panel substrate, a cylindrical substrate, a combination of a first permanent magnet array and a first coil array and a combination of a first permanent magnet array and a first coil array, which are coupled to the cylindrical substrate, so that levitation, axial translation and rotation of the cylindrical substrate can be made finely through the control of a magnetic force generated by the interaction between a magnetic field generated by electric current applied to the coil arrays and a magnetic field generated from the permanent magnet arrays corresponding to the coil arrays.