Cylindrical Master Mold Assembly for Seamless Lithography Masks
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for manufacturing cylindrical lithography masks often result in macro stitching lines due to the use of multiple polymer film pieces, which can compromise the quality and integrity of the nanostructured patterns.
Innovation Solution
A cylindrical master mold assembly is used, comprising a patterned component and a sacrificial casting component, where the sacrificial component is either fractured or dissolved to remove the mask after curing, allowing for the creation of seamless, high-quality nanostructured patterns on the polymer mask.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If multiple polymer film pieces are used to manufacture cylindrical lithography masks, then the manufacturing process is simpler and more flexible, but macro stitching lines appear that compromise pattern quality and integrity
Solution Approach 1:
The cylindrical mask is divided into multiple polymer film pieces that are joined together, allowing flexible manufacturing while maintaining pattern quality through careful alignment and joining processes
Solution Approach 2:
An intermediary joining process or material is used to connect multiple polymer film pieces without creating visible macro stitching lines, preserving the integrity of the nanopatterns across seams
2Ease of operation
If the mask is removed after curing, then the cylindrical mask can be used for lithography, but the delicate nanopatterns may be damaged during removal
Solution Approach 1:
The polymer material is preliminarily prepared with properties that facilitate safe removal after curing, such as controlled adhesion characteristics or mechanical properties that allow extraction without damaging the delicate nanopatterns
Solution Approach 2:
The physical or chemical parameters of the polymer material are changed during and after curing to enable easy removal while preserving nanopatterns, such as transitioning from a strongly adherent state to a more easily separable state
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the production of cylindrical masks with precise, seamless nanostructured patterns, enhancing the efficiency and quality of near-field optical lithography processes by eliminating macro stitching lines and protecting the delicate nanopatterns during removal.
Implementation Method 1
A polymer material may then fill the gap between the patterned component and the sacrificial casting component in order to form the cylindrical mask
Implementation Method 2
The sacrificial casting component may be removed once the polymer has been cured. According to certain aspects of the present disclosure, the sacrificial casting component may be fractured in order to allow the cylindrical mask to be removed
Data Source
AI summary
Aspects of the present disclosure include a cylindrical master mold assembly having a cylindrical patterned component with a first diameter and a sacrificial casting component with a second diameter. The component with the smaller radius may be co-axially inserted into the interior of the component with the larger radius. Patterned features may be formed on the interior surface of the cylindrical patterned component that faces the sacrificial casting component. The sacrificial casting component may be removed once a cast polymer has been cured to allow the polymer to be released. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.