DAC Amplifier Settling Time Acquisition for Electron Beam Writing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The precision of calculating settling time for DAC amplifiers in electron beam writing apparatuses is insufficient for high-precision micropatterning, leading to errors in beam deflection and reduced throughput.
Innovation Solution
A method involving writing multiple patterns with varying settling times and measuring the combined pattern dimensions to determine the optimal settling time for the DAC amplifier, ensuring precise beam deflection without compromising throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the settling time of the DAC amplifier is set to be short to improve throughput, then productivity increases, but manufacturing precision deteriorates due to errors in beam deflection movement amount
Solution Approach 1:
The patent applies parameter changes by systematically varying the settling time parameter of the DAC amplifier to find the optimal value. The method changes the settling time parameter from a sufficient initial value to progressively shorter values, measuring pattern dimensions at each step to determine when the parameter change no longer affects precision, thereby optimizing throughput while maintaining required precision.
2Manufacturing precision
If the settling time of the DAC amplifier is set to be long to ensure precise beam deflection, then manufacturing precision is maintained, but productivity decreases due to reduced throughput
Solution Approach 1:
The patent applies partial action by determining the minimum necessary settling time rather than using an excessively long settling time. The method progressively reduces the settling time from a sufficient value to find the point where further reduction no longer affects pattern dimension, thereby using only the necessary portion of the settling time required for precise beam deflection.
3Ease of operation
If conventional position measuring device methods are used to determine settling time, then ease of operation is maintained, but measurement precision is insufficient for high-precision micropatterning requirements
Solution Approach 1:
The patent applies mechanics substitution by replacing the conventional position measuring device with a pattern dimension measuring method. Instead of directly measuring beam position using position sensors, the method writes test patterns at different settling times and measures the resulting pattern dimensions, substituting a dimensional measurement approach for direct position measurement to achieve higher precision.
Data Source
AI summary
A method for acquiring a settling time according to an embodiment, includes writing a plurality of first patterns, arranged in positions apart from each other by a deflection movement amount, by using a DAC amplifier in which a settling time of the DAC amplifier is set to a first time to be a sufficient settling time; writing a plurality of second patterns, in a manner where corresponding first and second patterns are in a position adjacent, for each second time of different second times containing the sufficient settling time set as variable; measuring a width dimension of each of a plurality of combined patterns after adjacent first and second patterns are combined for the each second time set as variable; and acquiring the settling time of the DAC amplifier needed for deflection by the deflection movement amount, using the width dimensions.