Dielectric Barrier Discharge Plasma Reactor for Hazardous Material Abatement
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Solution Overview
Problem
Current plasma reactors for abating hazardous materials in low-pressure semiconductor and display manufacturing processes are expensive, have high maintenance and power consumption costs, and require complex RF power supplies, limiting their efficiency and longevity.
Innovation Solution
A plasma reactor design featuring a dielectric barrier discharge with a ring-shaped electrode structure and AC frequency driving, utilizing multiple ground and driving electrodes with alternating AC voltages to generate low-pressure plasma, which reduces installation and maintenance costs while increasing treatment efficiency and stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If inductive coupled plasma method with electrode coil structure is used, then plasma generation capability is improved, but installation cost and maintenance cost increase significantly
Solution Approach 1:
The patent replaces the complex inductive coupled plasma system with a dielectric barrier discharge (DBD) system that uses direct electrical discharge through a dielectric material. This substitution eliminates the need for expensive RF power suppliers and complex electrode coil structures, while maintaining effective plasma generation for hazardous material abatement
Solution Approach 2:
The patent employs a simpler electrode structure with dielectric barriers that can be easily replaced. The DBD electrodes and dielectric layers form a modular design that reduces maintenance costs compared to the expensive inductive coupling system, allowing for easier replacement of wear-prone components
2Stability of the object's composition
If RF driving method is used, then plasma stability is improved, but power consumption increases
Solution Approach 1:
The patent employs periodic AC voltage applied to the DBD electrodes to generate pulsed plasma discharge. This periodic action maintains plasma stability through repeated ionization cycles while consuming less power than continuous RF driving, as the dielectric barrier prevents continuous arc discharge and enables efficient energy coupling
Solution Approach 2:
The patent changes the driving parameters from RF frequency to lower frequency AC voltage suitable for DBD operation. This parameter change optimizes the balance between plasma stability and power consumption by matching the discharge characteristics with the dielectric barrier time constants, achieving stable plasma at reduced power levels
3Productivity
If multiple DBD cells are positioned in series, then treatment efficiency is improved, but device complexity increases
Solution Approach 1:
The patent divides the plasma treatment system into multiple DBD cells positioned in series along the gas flow path. Each cell contains electrodes and dielectric barriers that work independently to decompose hazardous materials, achieving high overall treatment efficiency while maintaining modular simplicity that reduces device complexity compared to non-modular designs
4Power
If dielectric barriers are added to electrodes, then plasma generation efficiency is improved, but manufacturing complexity increases
Solution Approach 1:
The patent uses thin dielectric film barriers coated on or between the electrodes. These thin film dielectrics improve plasma generation efficiency by preventing arc discharge and enhancing electron heating, while their thin nature and flexibility simplify the manufacturing process compared to bulky dielectric structures, making the system easier to fabricate and assemble
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design enhances the decomposition of hazardous materials, extends the lifespan of vacuum pumps by vaporizing powders, and reduces power consumption through optimized plasma conditions, achieving efficient and stable operation over a long period.
Implementation Method 1
a plasma reactor which generates low pressure plasma in a dielectric barrier discharge manner
Implementation Method 2
The plasma reactor generating the low pressure plasma installed in the front of the vacuum pump mainly uses an electrode structure in an inductive coupled plasma method and a radio frequency (RF) driving method
Implementation Method 3
The fine particles, SiO2, GeO2, metal, etc., are changed into a powder type by subjecting to a cooling process while passing through the joint pipe. The powder is a factor shortening a lifespan of the vacuum pump
Data Source
AI summary
The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode (21) and a second ground electrode (22) disposed at a distance from each other; a dielectric (30) fixed between the first ground electrode (21) and the second ground electrode (22); and at least one driving electrode (50) disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit (40) to receive a driving voltage therefrom.