Decompression Vaporizer for Substrate Processing Liquid

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Solution Overview

Problem

Existing substrate processing apparatuses face issues with particle generation on substrates due to incomplete vaporization of liquid coupling agents, leading to increased consumption and inefficiency in the processing liquid.

Innovation Solution

A substrate processing apparatus with a vaporizing tank and decompression unit that vaporizes processing liquid into a gas without passing through the processing space, using inert gas to enhance vaporization efficiency and reduce liquid phase remnants, thereby minimizing particle generation and liquid consumption.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the liquid coupling agent is vaporized by heating, then the coupling agent can be supplied into the processing chamber, but the vaporization may not progress sufficiently causing mist generation and particle contamination on the substrate

Engineering Contradiction:

Improvevaporization efficiencyVSAvoidparticle generation on substrate

Core Design Contradiction:

ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent utilizes phase transition from liquid to gas by decompression. The vaporizer decompresses the liquid coupling agent to directly transition it from liquid phase to gas phase, achieving complete vaporization without mist generation. This resolves the contradiction by ensuring efficient vaporization while preventing particle contamination on the substrate.

Inventive Principle:

Principle #36Phase transitions

2Reliability

If more liquid coupling agent is supplied to ensure sufficient vaporization, then the processing can be maintained, but the consumption amount of the coupling agent increases

Engineering Contradiction:

Improveprocessing qualityVSAvoidconsumption amount of coupling agent

Core Design Contradiction:

ReliabilityVSLoss of substance

Solution Approach 1:

By using decompression-based phase transition instead of heating, the patent achieves complete and efficient vaporization of the coupling agent. This ensures that nearly all supplied agent is effectively utilized for processing, minimizing waste and reducing consumption amount while maintaining processing quality.

Inventive Principle:

Principle #36Phase transitions

3Ease of operation

If the liquid coupling agent remains in the pipeline, then it can be supplied to the processing chamber, but it adheres to the substrate causing particle generation

Engineering Contradiction:

Improvesupply capabilityVSAvoidparticle generation on substrate

Core Design Contradiction:

Ease of operationVSObject-affected harmful factors

Solution Approach 1:

The patent applies decompression to transition the coupling agent from liquid to gas phase before it can adhere to the substrate. This ensures complete vaporization in the pipeline, allowing the agent to be supplied as gas to the processing chamber without causing particle contamination on the substrate.

Inventive Principle:

Principle #36Phase transitions

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively suppresses particle generation on substrates and reduces the consumption of processing liquid by ensuring complete vaporization and efficient gas supply, improving processing efficiency.

Implementation Method 1

a vaporizing tank, configured to store a processing liquid therein, having a vaporization space in which the stored processing liquid is allowed to be vaporized; a decompression driving unit configured to vaporize the processing liquid stored in the vaporization space into a processing gas by decompressing the vaporization space

Methodology Applied

Scientific EffectDecompression vaporization: Evaporation

Implementation Method 2

an inert gas supply unit configured to supply an inert gas into the vaporization space

Methodology Applied

Scientific EffectGas supply and mixing: Convection

Data Source

PatentUS10689762B2Substrate processing apparatus, substrate processing method and recording medium

Publication Date: 2020.06.23 TOKYO ELECTRON LTD

AI summary

A substrate processing apparatus can suppress particle generation on a substrate, and can reduce a consumption amount of a processing liquid. A substrate processing apparatus 1 includes a processing chamber 30 having a processing space 31 in which a substrate W is processed; a vaporizing tank 60, configured to store the processing liquid therein, having a vaporization space 61 in which the stored processing liquid is allowed to be vaporized; a decompression driving unit 70 configured to decompress the vaporization space 61; and a control unit 18. The control unit 18 vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 without through the processing space 31, and then, vaporizes the processing liquid into the processing gas by decompressing the vaporization space 61 through the processing space 31, and supplies an inert gas into the vaporization space 61.