Deep Guard Ring and Noise Blocking Area for Image Sensor Crosstalk

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Solution Overview

Problem

Image sensors face challenges in reducing substrate noise and crosstalk, particularly in high-pixel sensors, where high-speed framing can lead to dark random noise and horizontal line noise, and existing deep N-well implementations are difficult to apply to pixel arrays and struggle with P-substrate ground connections.

Innovation Solution

A backside illumination image sensor with a deep photodiode guard ring formed to contact a substrate or ion implantation layer, creating a draining channel for thermoelectrons and incorporating a noise blocking area in the deep guard ring to isolate blocks and prevent substrate crosstalk noise, using deep N-type ion implantation and epitaxial layers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If deep N-well is used to reduce substrate noise, then substrate noise reduction is improved, but it is difficult to apply to pixel arrays and cannot overcome crosstalk through P-substrate

Engineering Contradiction:
Improvesubstrate noiseVSAvoidapplicability to pixel arrays
Core Design Contradiction:
Object-affected harmful factorsVSAdaptability or versatility

Solution Approach 1:

The substrate is divided into multiple isolated P-type well regions arranged in a grid pattern throughout the pixel array. Each P-type well acts as an independent noise isolation compartment, segmenting the substrate into electrically isolated zones that prevent noise propagation while maintaining pixel array functionality.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The noise isolation structure transitions from a single deep N-well dimension to a two-dimensional grid of P-type wells distributed across the substrate. This dimensional expansion allows noise isolation to be applied throughout the entire pixel array area rather than at isolated points, overcoming the limitation of deep N-well applicability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Speed

If high-speed framing is used in high-pixel sensors, then imaging speed is improved, but dark random noise and horizontal line noise increase

Engineering Contradiction:
Improveframing speedVSAvoiddark random noise
Core Design Contradiction:
SpeedVSObject-affected harmful factors

Solution Approach 1:

P-type wells are introduced as intermediary structures between adjacent pixels and circuit blocks. These intermediary regions act as electrical buffers that intercept and dissipate noise signals before they can propagate to sensitive photodetector elements, thereby suppressing dark random noise generated during high-speed framing operations.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If P-substrate is used to provide ground connections, then electrical connectivity is improved, but crosstalk occurs between blocks

Engineering Contradiction:
Improveground connectionVSAvoidcrosstalk
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The continuous P-substrate ground connection is segmented into discrete, isolated P-type well regions. Each well is electrically isolated from its neighbors by reverse-biased PN junctions, creating compartmentalized ground zones that maintain local electrical connectivity while preventing noise crosstalk between adjacent blocks through the substrate.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Effectively eliminates electrical crosstalk and substrate noise, allowing for improved picture quality and reduced dark current, enabling the manufacture of high-definition, highly-integrated image sensors with increased cell density on semiconductor substrates.

Implementation Method 1

a deep guard ring formed to contact a substrate or an ion implantation layer in a cell structure so as to form a draining channel for thermoelectrons generated at the substrate or the ion implantation layer

Methodology Applied
Scientific EffectThermoelectron generation: Thermionic Emission

Implementation Method 2

a structure functioning as a thin P-substrate is formed by PIN ion-implantation on the backside

Methodology Applied
Scientific EffectIon implantation: Ion Implantation

Implementation Method 3

a DNW process can be eliminated by forming a deep P/N guard ring using high-energy ion implantation

Methodology Applied
Scientific EffectHigh-energy ion implantation: Ion Implantation

Data Source

PatentUS8853705B2Image sensor including guard ring and noise blocking area to block noise and method of manufacturing the same
Publication Date: 2014.10.07 SAMSUNG ELECTRONICS CO LTD
  • US8853705B2 patent drawing
  • US8853705B2 patent drawing
  • US8853705B2 patent drawing

AI summary

An image sensor including a deep guard ring and a noise blocking area and a method of manufacturing the same. The image sensor includes the deep guard ring and a deep P well surrounding the noise blocking area, thereby preventing crosstalk between adjacent pixels. In addition, an ion implantation layer is divided by the noise blocking area, so that substrate crosstalk is effectively eliminated.