Deflection Device With Refractive Power In Microlithography
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Solution Overview
Problem
Microlithographic projection exposure systems face challenges in achieving flexible variation of intensity distribution with limited maximum tilt angles of mirror elements, leading to mechanically complex and costly Fourier optics with large focal lengths.
Innovation Solution
Incorporating a deflection device with refractive power surfaces downstream of the mirror arrangement to convert angular illumination light into spatial distributions in the pupil plane, reducing the need for extensive refractive lenses and allowing for a more compact optical design.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the maximum tilt angle of mirror elements is limited to a few degrees to avoid mechanical problems and heat dissipation issues, then the Fourier optics must have relatively large focal lengths (several meters), which increases device complexity and cost
Solution Approach 1:
The deflection device is merged with the Fourier optics by providing at least one deflection surface with refractive power. This integration allows the deflection device to perform both beam deflection and Fourier transformation functions, eliminating the need for separate large-focal-length optics and reducing overall system complexity while maintaining reliable mirror element operation at limited tilt angles
2Length of stationary object
If Fourier optics are designed as an optical zoom system with multiple refractive lenses to achieve large focal lengths, then the material and cost expenditure fundamentally increases
Solution Approach 1:
The deflection device is merged with the Fourier optics by providing at least one deflection surface with refractive power. This integration allows the deflection device to perform both beam deflection and Fourier transformation functions, eliminating the need for separate large-focal-length optics and reducing overall system complexity while maintaining reliable mirror element operation at limited tilt angles
3Length of stationary object
If multiple refractive lenses are used in the Fourier optics to achieve large focal lengths, then the structural complexity and spatial accommodation requirements increase
Solution Approach 1:
The deflection device is merged with the Fourier optics by providing at least one deflection surface with refractive power. This integration allows the deflection device to perform both beam deflection and Fourier transformation functions, eliminating the need for separate large-focal-length optics and reducing overall system complexity while maintaining reliable mirror element operation at limited tilt angles
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables flexible illumination settings with reduced mechanical stress and heat dissipation issues, while minimizing the number of refractive lenses required, resulting in a more compact and cost-effective optical system.
Implementation Method 1
a deflection device which, in relation to the optical beam path, has at least one deflection surface for deflecting the optical axis downstream of the mirror arrangement with refractive power
Data Source
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AI summary
The invention relates to an optical system for a microlithographic projection exposure system. An optical system for a microlithographic projection exposure system comprises an optical axis (OA), at least one mirror arrangement (200, 300) which has a plurality of mirror elements (200a, 200b, 200c,..., 300a, 300b, 300c,...) wherein these mirror elements are independently adjustable to change the angular distribution of the light reflected by the mirror arrangement, and a deflection device (210, 310) wherein this deflection device (210, 310) has at least one deflection surface (212) with respect to the optical beam path after the mirror arrangement (200, 300), at which a deflection of the optical axis (OA) occurs, and wherein this at least one deflection surface (212) has refractive power.