Deflector Array Electrode Orientation for Charged Particle Beam Precision
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Solution Overview
Problem
Conventional deflector arrays in charged particle beam exposure apparatuses face limitations in minimizing deflection aberration due to the constraints on electrode length, which affects the drawing accuracy of semiconductor devices.
Innovation Solution
The deflector array is arranged such that the length of the electrodes is maximized by positioning them at angles of 45°, 63.4°, or perpendicular to the direction of the charged particle beam, allowing for longer electrode lengths and reduced deflection aberration, and the electrodes are parallel or shorten towards their ends.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the deflector array is arranged with electrodes at conventional orientations (perpendicular to beam direction with pitch-based spacing), then the device complexity and manufacturing are simplified, but the electrode length becomes insufficient leading to increased deflection aberration
Solution Approach 1:
The patent applies asymmetry by arranging deflectors at specific non-conventional angles (45° or 63.4°) relative to the charged particle beam direction, rather than using symmetric perpendicular arrangements. This asymmetric orientation allows the electrode length to be maximized relative to the beam pitch, thereby reducing deflection aberration while maintaining manufacturability through precise angular positioning.
Solution Approach 2:
The patent transitions from a conventional one-dimensional electrode length constraint (limited by pitch in perpendicular arrangement) to a two-dimensional optimization by introducing specific angular orientations. This dimensional change in the arrangement strategy enables the electrode length to exceed the pitch distance, effectively resolving the length limitation through spatial reconfiguration.
2Manufacturing precision
If the electrode length is increased to reduce deflection aberration, then the drawing accuracy improves, but the distance between deflectors must increase which reduces the deflector array density
Solution Approach 1:
By using asymmetric angular orientations (45° or 63.4°), the patent enables electrode lengths greater than the pitch distance without requiring increased physical spacing between deflectors. This asymmetric geometry allows the electrode to extend diagonally across the pitch, maximizing length while maintaining high deflector density for productivity.
Solution Approach 2:
The patent exploits the two-dimensional space by orienting electrodes at specific angles rather than strictly perpendicular to the beam. This angular dimension allows the electrode length to be decoupled from the pitch distance constraint, enabling long electrodes within compact deflector spacing to maintain both accuracy and productivity.
3Ease of manufacture
If the deflector array uses conventional perpendicular electrode arrangement, then the manufacturing and alignment are easier, but the electrode length is constrained by the pitch distance resulting in higher deflection aberration
Solution Approach 1:
The patent replaces the simple perpendicular (symmetric) arrangement with specific asymmetric angles (45° or 63.4°). While this increases alignment precision requirements slightly, it dramatically increases electrode length beyond the pitch distance, thereby reducing deflection aberration and improving drawing accuracy despite the moderate increase in alignment complexity.
Solution Approach 2:
The patent changes the angular parameter of electrode orientation from the conventional 90° (perpendicular) to specific optimized angles (45° or 63.4°). This parameter change transforms the electrode length from being limited by pitch to exceeding pitch, reducing deflection aberration while maintaining reasonable manufacturing feasibility through precise angular control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This arrangement significantly reduces deflection aberration, enabling high drawing accuracy and precision in semiconductor device manufacturing.
Implementation Method 1
a pair of electrodes 213 opposing each other through the opening 212
Implementation Method 2
deflectors, which deflect charged particle beams
Data Source
AI summary
A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the substrate, and each of the plurality of deflectors includes a pair of electrodes that oppose each other through the opening and are configured to deflect a single charged particle beam. The plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors that are located nearest to each other. The plurality of deflectors is arrayed to form a checkerboard lattice, and two openings of the two of the plurality of deflectors overlap in the longitudinal direction.