Deflector Placement in Charged-Particle Beam Instruments
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Solution Overview
Problem
Existing electron beam lithographic systems face challenges in correcting deflection aberrations and oblique incidence without increasing the electrode length or reducing the diameter of the second deflector, which can lead to contamination and charging issues, and higher deflection voltage is detrimental to throughput.
Innovation Solution
The second deflector is placed ahead of the demagnifying lens, allowing the demagnifying lens to magnify the angle of deflection, thereby reducing the required deflection voltage and preventing adverse effects on deflection speed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the electrode length of the second deflector is increased to correct deflection aberrations, then the deflection aberration correction improves, but the device complexity and contamination risk increase
Solution Approach 1:
The patent changes the spatial arrangement by placing the second deflector in a different position relative to the demagnifying lens, utilizing the magnification of deflection angle to achieve the same correction effect with a more compact electrode configuration
2Manufacturing precision
If the inside diameter of the electrode of the second deflector is reduced to correct deflection aberrations, then the deflection aberration correction improves, but the contamination and charging effects worsen
Solution Approach 1:
The patent changes the spatial arrangement by placing the second deflector in a different position relative to the demagnifying lens, utilizing the magnification of deflection angle to achieve the same correction effect with a more compact electrode configuration
Solution Approach 2:
The patent changes the operational parameters by reducing the deflection voltage of the second deflector while maintaining correction effectiveness through the altered spatial configuration, thereby reducing harmful effects
3Manufacturing precision
If the deflection voltage of the second deflector is increased to correct deflection aberrations, then the deflection aberration correction improves, but the throughput decreases
Solution Approach 1:
The patent changes the operational parameters by reducing the deflection voltage of the second deflector while maintaining correction effectiveness through the altered spatial configuration, thereby preserving high throughput
4Manufacturing precision
If the second deflector is placed behind the demagnifying lens, then the deflection aberration correction is effective, but the deflection speed is adversely affected
Solution Approach 1:
The patent changes the spatial arrangement by placing the second deflector ahead of the demagnifying lens rather than behind it, utilizing the lens to magnify the deflection angle and enable lower voltage operation that preserves deflection speed
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively corrects deflection aberrations without increasing the electrode length or reducing the diameter of the second deflector, minimizing contamination risks and maintaining high throughput by lowering the deflection voltage.
Implementation Method 1
the demagnifying lens to magnify the angle of deflection
Implementation Method 2
a first deflector located behind the demagnifying lens and determining a beam position on the surface of the workpiece irradiated with the beam, and a second deflector located ahead of the demagnifying lens and canceling out deflection aberrations
Data Source
AI summary
A charged-particle beam instrument is offered which can cancel out deflection aberrations arising from a first deflector or oblique incidence on the surface of a workpiece without (i) increasing the electrode length, (ii) reducing the inside diameter of the electrode, or (iii) increasing the deflection voltage too much. The instrument has an electron source for producing an electron beam, a demagnifying lens for condensing the beam, an objective lens for focusing the condensed beam onto the surface of the workpiece, the first deflector located behind the demagnifying lens, and a second deflector located ahead of the demagnifying lens. The first deflector determines the beam position on the surface of the workpiece. The second deflector cancels out deflection aberrations arising from the first deflector.