Deflector Plate Cleaning for Multi-Station Semiconductor Chambers
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Solution Overview
Problem
Existing semiconductor processing chambers face challenges in efficiently cleaning accumulated unwanted materials and contaminants from internal surfaces and features, such as the chamber walls and gas distribution devices, which affect throughput, contamination, and equipment functionality.
Innovation Solution
A deflector plate with recesses and a cleaning gas distribution nozzle system is used to direct cleaning chemistry, like fluorine plasma, at an upwards angle into processing stations, effectively cleaning the chamber surfaces by flowing the chemistry onto a deflector plate positioned underneath the nozzle, which then directs it into each station.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If cleaning chemistry is directed downwards or horizontally onto chamber surfaces, then the cleaning process can reach certain areas, but it cannot effectively clean the undersides of showerheads and other overhead components
Solution Approach 1:
The patent inverts the conventional cleaning approach by directing cleaning chemistry upwards from below the chamber floor rather than downwards from above. This inversion allows the cleaning chemistry to effectively reach undersides of showerheads and other overhead components that are inaccessible from traditional top-down cleaning methods.
Solution Approach 2:
The patent introduces a new spatial dimension for cleaning by positioning the cleaning chemistry source beneath the chamber floor and directing it upwards. This adds a vertical dimension from below that complements traditional horizontal and downward cleaning directions, enabling access to previously unreachable surfaces.
2Reliability
If a deflector plate with recesses is used to direct cleaning chemistry into processing stations, then cleaning effectiveness is improved, but device complexity increases
Solution Approach 1:
The deflector plate is segmented into multiple recesses, each configured to direct cleaning chemistry into specific processing stations. This segmentation allows targeted cleaning of individual stations while using a single integrated plate structure, improving effectiveness without requiring separate systems for each station.
Solution Approach 2:
The deflector plate serves multiple functions simultaneously: it distributes cleaning chemistry to multiple processing stations, directs flow at appropriate angles, and can be configured to clean different areas by adjusting the recess geometries. This multi-functionality reduces the need for multiple separate cleaning components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach efficiently cleans the processing stations, including showerhead surfaces, reducing contamination and maintaining high throughput by ensuring effective distribution and utilization of cleaning gases.
Implementation Method 1
directing a cleaning chemistry, such as a fluorine plasma, onto a deflector plate
Data Source
AI summary
Disclosed are various systems that allow for plasma delivery from a central location in a multi-station processing chamber to be redirected to different processing stations within the chamber. Such systems may include a deflector plate that is mounted to a wafer indexer such that the deflector plate is centered on the wafer indexer. In other implementations, such systems may include a deflector plate that is mounted in a fixed relationship with a ceiling of the processing chamber. The deflector plate may have a body having a top surface and an underside surface that are on opposite sides of the body. A plurality of recesses may be arranged across the top surface in a radial pattern around a center axis.