Deformable Micro Chamber for Semiconductor Processing Fluid Control

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Solution Overview

Problem

Existing semiconductor processing apparatuses fail to fully control the flow of chemical agents within a micro chamber, leading to incomplete processing and inefficient collection of discharge liquids, as they rely primarily on pressure changes and lack precise control over fluid flow patterns.

Innovation Solution

A semiconductor processing apparatus with a micro chamber that features moveable upper and lower chamber portions, driven by a plurality of drive units, allowing for tilt or deformation of the working surfaces to control the flow of chemical agents and facilitate efficient collection of discharge liquids through predetermined gap adjustments.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If chemical agents flow under pressure change within the chamber, then the processing can be performed, but the collection effect of chemical agents is insufficient and flow control is imprecise

Engineering Contradiction:
Improvecollection effect of chemical agentsVSAvoidflow control mechanism
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies the dynamics principle by making the chamber body deformable under actuation. The chamber body can dynamically change its internal cavity shape and volume in response to external forces, enabling precise control over chemical agent flow patterns. This dynamic deformation capability allows the system to optimize both processing effectiveness and collection efficiency without requiring complex additional flow control components.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent utilizes parameter changes by modifying the physical state of the chamber body through deformation. By changing the shape and volume parameters of the internal cavity, the system controls the flow characteristics of chemical agents. This approach enables precise regulation of fluid dynamics through simple mechanical deformation rather than complex control mechanisms.

Inventive Principle:
Principle #35Parameter changes

2Adaptability or versatility

If the chamber structure is fixed, then the device is simple, but the flow pattern of chemical agents cannot be optimized for different processing requirements

Engineering Contradiction:
Improveflow pattern controlVSAvoidchamber structure
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The chamber body is designed to be dynamically deformable, allowing it to adapt its internal cavity configuration for different processing requirements. This dynamic structure can change shape and volume to create optimized flow patterns for various chemical agent processing tasks, providing versatility without adding complex mechanical components.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The deformable chamber body serves multiple functions: it acts as both the structural container and the flow control mechanism. By deforming the chamber body, the system can optimize flow patterns for different processing scenarios, making a single structure perform multiple functions rather than requiring separate components for each function.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Productivity

If chemical agents are discharged based on pressure change only, then the discharge process is simple, but the collection efficiency is reduced

Engineering Contradiction:
Improvecollection efficiencyVSAvoiddischarge control mechanism
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The discharge process utilizes dynamic deformation of the chamber body to enhance collection efficiency. By deforming the chamber during discharge, the system creates optimized flow paths that improve chemical agent collection. This dynamic approach enhances productivity through simple mechanical deformation rather than complex discharge control mechanisms.

Inventive Principle:
Principle #15Dynamics

Data Source

PatentUS10283389B2Adjustable semiconductor processing device and control method thereof
Publication Date: 2019.05.07 WUXI HUAYING MICROELECTRONICS TECH CO LTD
  • US10283389B2 patent drawing
  • US10283389B2 patent drawing
  • US10283389B2 patent drawing

AI summary

Disclosed is an adjustable semiconductor processing apparatus and a control method thereof. The apparatus comprises a micro chamber with an upper chamber portion defining an upper working surface and a lower chamber portion defining a lower working surface that are relatively moveable towards each other between an open position and a closed position. When the chamber is in the closed position, a cavity formed by the upper working surface and the lower working surface defines a gap between the upper working surface, the lower working surface and a semiconductor wafer received in the cavity for flow of a processing fluid. A drive device enables the upper working surface of the upper chamber portion or/and the lower working surface of the lower chamber portion to tilt or deform to control flow of chemical agents within the micro chamber.