Degasser System With Multiple Separators For Semiconductor Fluid Control
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Solution Overview
Problem
Existing degasser equipment for semiconductor processing is inflexible and requires multiple systems for varying demand, leading to increased capital costs and floor space usage.
Innovation Solution
A degasser system comprising a vacuum chamber with multiple separators, a feed line, and a collection line, allowing for the removal of entrapped or dissolved gases from processing fluids and enabling flexible operation with a single vacuum chamber and control system.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple separate degasser systems are used to meet varying demand, then gas removal capacity is sufficient, but capital equipment costs and floor space increase
Solution Approach 1:
The patent combines multiple degasser functionalities into a single integrated system. Multiple feed lines and collection lines are connected to a common vacuum chamber, allowing one degasser to handle multiple fluid streams and variable demand levels, replacing the need for multiple separate degasser units.
Solution Approach 2:
The degasser system is designed with universal applicability through multiple feed line connections and collection line connections that can accommodate varying demand levels. The single vacuum chamber can serve multiple functions by processing different fluid streams simultaneously or sequentially, making the system adaptable to changing production requirements.
2Productivity
If multiple separate degasser systems are used to meet varying demand, then gas removal capacity is sufficient, but floor space usage increases
Solution Approach 1:
The patent combines multiple degasser functionalities into a single integrated system. Multiple feed lines and collection lines are connected to a common vacuum chamber, allowing one degasser to handle multiple fluid streams and variable demand levels, replacing the need for multiple separate degasser units that would consume more floor space.
3Device complexity
If a single vacuum chamber with multiple separators is used, then device complexity and cost are reduced, but flexibility to meet varying demand must be maintained
Solution Approach 1:
The system incorporates dynamic control through multiple valves that can be opened or closed to redirect fluid flow through different feed lines and collection lines. This allows the single vacuum chamber to adapt its capacity and configuration to meet varying demand levels in real-time, maintaining flexibility without requiring multiple fixed systems.
Solution Approach 2:
The vacuum chamber is divided into multiple separators within it, allowing the system to process different fluid streams simultaneously or selectively. This internal segmentation provides flexibility to handle varying demand by activating only the necessary separators, maintaining adaptability while using a single integrated unit.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively removes gases from semiconductor processing fluids, allowing for accurate fluid control and flexible operation to meet varying demand without the need for multiple degasser systems.
Implementation Method 1
at least one vacuum for applying a pressure differential across the separator to cause molecules of the entrapped or dissolved gas to leave the liquid and to permeate through the one or more than one separator
Implementation Method 2
molecules of the entrapped or dissolved gas to leave the liquid and to permeate through the one or more than one separator
Data Source
AI summary
Degassers, degassing systems, and methods of using degassers to remove gas molecules entrapped or dissolved in a processing liquid. The degasser has a vacuum chamber with one or more walls; one or multiple inlets and one or multiple outlets through which the liquid is respectively passed into and out of the vacuum chamber, the inlet(s) and the outlet(s) penetrating the one or more walls; one or multiple separators located inside the vacuum chamber and being pervious to the gas molecules but impervious to the liquid; at least one vacuum for applying through a vacuum port a pressure differential across the separator(s) to cause the gas molecules to leave the liquid and to permeate through the separator(s) thereby removing the entrapped or dissolved gas from the liquid; and optionally one or multiple feed lines in fluid communication with the inlet(s) and two or more than two separators.