Degassing Processing Liquid Supply Apparatus for Semiconductor Substrates
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Solution Overview
Problem
In photolithography processes, processing liquids used in semiconductor manufacturing often contain bubbles or particles that can cause unevenness and defects on substrates, and existing systems waste liquid by discarding it during dummy ejections to prevent particle growth in filters, leading to inefficient use and filter deterioration.
Innovation Solution
A processing liquid supplying apparatus with a control unit that decompresses and degasses the liquid using supply and ejection pumps, passing it through a filter to remove bubbles and particles efficiently, reducing waste and maintaining filter performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If processing liquid is supplied through a filter to remove bubbles and particles, then coating quality is improved, but the filter deteriorates due to particle growth and liquid waste
Solution Approach 1:
The system performs preliminary degassing of the processing liquid before it reaches the filter by using a vacuum pump to remove dissolved gases and form bubbles, which are then removed by the filter. This preliminary action prevents particle growth in the filter by continuously refreshing the liquid and removing bubbles before they can cause contamination.
Solution Approach 2:
The system intentionally discards a small amount of processing liquid through the filter to remove accumulated particles and bubbles, then recovers and reuses the filtered liquid. This cyclic process maintains filter performance by preventing particle growth while minimizing overall liquid waste through the recovery and reuse mechanism.
2Manufacturing precision
If processing liquid is degassed by reducing pressure, then bubbles are removed, but gas dissolved in the liquid forms bubbles that need to be removed again
Solution Approach 1:
The system continuously circulates the processing liquid through the vacuum pump and filter in a closed loop, maintaining continuous degassing and bubble removal. This continuous action ensures that dissolved gases are constantly removed and bubbles are prevented from forming, eliminating the need for repeated degassing cycles and improving processing efficiency.
3Adaptability or versatility
If multiple supply nozzles are provided for process diversification, then versatility is improved, but liquid waste increases due to dummy ejections
Solution Approach 1:
The filter device serves multiple functions: it removes particles from the processing liquid, collects bubbles formed during degassing, and prevents particle growth in the liquid. This multi-functionality allows the system to maintain versatility with multiple supply nozzles while reducing liquid waste by eliminating the need for dummy ejections to clear particles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively suppresses particle growth in the processing liquid without wasting liquid, enhancing the efficiency and reliability of the photolithography process by ensuring clean substrates and prolonging filter effectiveness.
Implementation Method 1
a vacuum pump or the like is used to decompress the processing liquid, thereby removing gas dissolved in the processing liquid
Implementation Method 2
gas dissolved in the processing liquid become bubbles when the liquid pressure of the processing liquid which is defoamed by the filter is reduced
Implementation Method 3
a filter device provided in the supply path and configured to remove foreign matters in the processing liquid
Data Source
AI summary
Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign matters in the processing liquid; a supply pump and an ejection pump which are provided in the supply path at a primary side and a secondary side of the filter device, respectively; and a control unit configured to output a control signal to decompress and degas the processing liquid supplied from the processing liquid supply source by using one of the supply pump and the ejection pump, and subsequently, pass the degassed processing liquid through the filter device beginning from the primary side to the secondary side of the filter device by using the supply pump and the ejection pump.