Dehydrated Filter Target Supply Device for EUV Nozzle Clog Prevention
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Solution Overview
Problem
In EUV light generation devices, particles such as tin oxides can form and clog nozzle holes, disrupting the stable supply of targets due to water components adsorbed on filter surfaces reacting with the target material, leading to unstable target output.
Innovation Solution
A target supply device with a dehydration process, including a baking process for components like porous filters and ingots, to remove adsorbed water components and reduce oxide formation, ensuring stable target material delivery by using a baking processing device that controls temperature and pressure to separate water from the target supply unit components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a filter is used to suppress passage of particles in the metal target, then particle contamination is reduced, but water components adsorb on the filter surface causing oxide formation that clogs the nozzle hole
Solution Approach 1:
The filter is subjected to a dehydration process before being mounted in the target supply device to remove adsorbed water components. This preliminary action prevents oxide formation during operation, as the water that would otherwise react with the metal target to form oxides is removed in advance through heating at 100°C or higher for 1 to 48 hours.
2Reliability
If the target supply device is heated to remove adsorbed water, then oxide formation is prevented, but energy consumption increases
Solution Approach 1:
The dehydration process is performed as a preliminary step before the target supply device is put into operation. By removing adsorbed water components during the dehydration process rather than continuously during operation, energy is consumed only when needed for preparation, not during continuous use, thus reducing overall energy consumption while ensuring reliable operation.
Solution Approach 2:
The dehydration process uses specific temperature parameters (100°C or higher) and time parameters (1 to 48 hours) to effectively remove adsorbed water. By optimizing these parameters, the process achieves complete dehydration with minimal energy consumption, balancing energy use with reliability.
3Reliability
If the filter is heated to high temperature for dehydration, then water adsorption is removed, but the filter material may be affected by thermal stress
Solution Approach 1:
The dehydration process specifies heating at 100°C or higher for 1 to 48 hours, which provides sufficient temperature to remove adsorbed water while avoiding excessive thermal stress that could damage the filter material. This parameter optimization ensures effective dehydration without compromising filter integrity.
Solution Approach 2:
The filter undergoes dehydration as a preliminary processing step before being installed in the target supply device. This ensures the filter is properly dehydrated and stabilized before operation, preventing thermal stress issues during actual use while maintaining filter material integrity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The dehydration process effectively reduces water adsorption on components, preventing oxide formation and ensuring stable target output by maintaining the target supply unit at temperatures above 110°C and controlling pressure, thereby enhancing the reliability of EUV light generation.
Implementation Method 1
heating the target supply device to a temperature above 110°C to separate water components from the components
Implementation Method 2
controlling pressure to separate water from the target supply unit components
Data Source
AI summary
A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.