Delivery Chamber Pressure Control for Substrate Particle Suppression
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Solution Overview
Problem
Conventional substrate processing apparatuses face challenges in preventing particle adherence to substrates during transfer through buffer regions, where temporary storage leads to increased particle adhesion.
Innovation Solution
The substrate processing apparatus maintains a higher internal pressure in the delivery chamber compared to the carry-in/out and transfer chambers, utilizing air flow configurations to create pressure differences and air curtains that suppress particle introduction and adherence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the delivery chamber is used as a buffer region for temporary substrate storage, then the substrate transfer efficiency is improved, but particles are likely to adhere to the substrate during temporary storage
Solution Approach 1:
The patent applies pneumatic pressure control by maintaining higher internal pressure in the delivery chamber compared to the carry-in/out chamber and transfer chamber. This pressure differential creates air flow that moves from the delivery chamber toward the other chambers, forming an air curtain that prevents particles from adhering to substrates during temporary storage while maintaining transfer efficiency
2Object-affected harmful factors
If the internal pressure of the delivery chamber is increased to suppress particle introduction, then particle adherence is reduced, but the complexity of pressure control system increases
Solution Approach 1:
The patent applies local quality by creating different pressure conditions in different chambers - specifically, the delivery chamber is maintained at higher pressure while the carry-in/out chamber and transfer chamber are maintained at lower pressure. This localized pressure differentiation targets particle suppression specifically where needed (at the substrate storage interface) without requiring the entire system to operate under complex pressure control
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively reduces particle adherence to substrates by maintaining a clean environment and preventing particle introduction during transfer, enhancing the cleanliness of the substrate processing system.
Implementation Method 1
an internal pressure of the delivery chamber is higher than an internal pressure of the carry-in/out chamber and an internal pressure of the transfer chamber
Data Source
AI summary
Particles can be suppressed from adhering to a substrate. A substrate processing apparatus includes a carry-in/out chamber, a transfer chamber, and a delivery chamber. In the carry-in/out chamber, the substrate is carried in and out with respect to a carrier, and in the transfer chamber, a transfer path for the substrate toward a substrate processing chamber, where a predetermined process is performed on the substrate, is formed. Further, the delivery chamber is arranged between the carry-in/out chamber and the transfer chamber. Moreover, an internal pressure of the delivery chamber is higher than an internal pressure of the carry-in/out chamber and an internal pressure of the transfer chamber.