Precursor Delivery Line Passivation for In Situ Oxyhalide Cleaning
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Solution Overview
Problem
Conventional methods for removing molybdenum oxyhalide precursor contaminants from delivery lines in semiconductor processing equipment require downtime, disrupting continuous operation and are inefficient.
Innovation Solution
In situ cleaning of precursor delivery lines using surface passivating agents and/or corrosion inhibitors, such as fluorine and tungsten halides, to prevent and remove contaminants during the deposition process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional methods are used to remove molybdenum oxyhalide precursor contaminants from delivery lines, then contaminants are eliminated, but production downtime occurs and continuous operation is interrupted
Solution Approach 1:
The patent applies preliminary action by pre-treating the delivery lines with surface passivating agents before contaminant formation occurs. This preventive measure creates a protective layer on the line surfaces that prevents molybdenum oxyhalide precursor contaminants from adhering and accumulating, thereby eliminating the need for shutdown cleaning while maintaining continuous production
Solution Approach 2:
The patent implements continuity of useful action by introducing corrosion inhibitors and surface passivating agents during ongoing deposition processes rather than requiring shutdowns. The treatment agents are delivered continuously or periodically through the same delivery lines during normal operation, ensuring both contaminant prevention and uninterrupted production
2Reliability
If delivery lines are dismantled and replaced for cleaning, then contaminants are removed, but maintenance time and operational disruption increase
Solution Approach 1:
The patent applies self-service by enabling the delivery lines to clean themselves through in-situ treatment with surface passivating agents and corrosion inhibitors. The treatment agents are introduced directly into the delivery lines during operation, allowing the system to maintain its own cleanliness without external intervention or dismantling, thus eliminating maintenance downtime while ensuring continuous line cleanliness
3Productivity
If surface passivating agents and corrosion inhibitors are used for in situ cleaning, then continuous operation is maintained, but additional chemical treatment processes are required
Solution Approach 1:
The patent applies universality by using surface passivating agents and corrosion inhibitors that serve multiple functions simultaneously. These chemical treatments not only prevent contaminant formation but also protect the delivery line materials from corrosion and extend system life, thereby maintaining continuous deposition efficiency while managing system complexity through multi-functional agents
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables continuous operation of the deposition process by effectively preventing and clearing contaminants without interrupting production, enhancing efficiency and reducing maintenance downtime.
Implementation Method 1
pre-treating the delivery lines with a surface passivating agent
Implementation Method 2
supplying the precursor delivery lines with periodic flows of at least one corrosion inhibitor
Data Source
AI summary
Provided are methods for increasing the efficiency of atomic layer deposition of molybdenum metal by in situ cleaning and decontamination of molybdenum oxyhalide precursor delivery lines to a deposition chamber. The cleaning process may take place by pre-treating the delivery lines with at least one surface passivating agent and/or by periodically treating the delivery lines with at least one corrosion inhibitor. Also provided are methods of removing oxidation from a deposited molybdenum film.