Dendritic SiC Composite Filler for Thermal Expansion Matching

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Solution Overview

Problem

Existing composite materials with SiC filler achieve only about half of SiC's inherent thermal conductivity and do not adequately address the need for a small difference in thermal expansion coefficient with semiconductor elements, limiting their effectiveness in demanding environments.

Innovation Solution

A composite material with a continuous phase of metal or synthetic resin and SiC filler dispersed within, utilizing dendritic crystals with a circularity of less than 0.206, enhances thermal conductivity and reduces thermal expansion differences.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If conventional SiC filler with regular shape is used in composite material, then the processing and dispersion is easier, but the thermal conductivity is reduced to about half of SiC's inherent thermal conductivity

Engineering Contradiction:
Improveprocessing easeVSAvoidthermal conductivity
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent applies asymmetry by using dendritic SiC crystals with irregular, non-spherical shapes instead of conventional regular-shaped fillers. These asymmetric dendritic structures with multiple branches and facets create more contact points and pathways for heat conduction, enabling the composite material to achieve higher thermal conductivity (40-80 W/mK) compared to traditional fillers, while still maintaining ease of processing and dispersion in the resin matrix.

Inventive Principle:
Principle #4Asymmetry

2Reliability

If SiC filler is used to improve thermal conductivity, then heat dissipation is enhanced, but the thermal expansion coefficient matching with semiconductor elements is not adequately addressed

Engineering Contradiction:
Improvethermal conductivityVSAvoidthermal expansion coefficient matching
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent applies parameter changes by carefully controlling the composition ratio of SiC filler (70-90 vol%) in the resin matrix, and by selecting resin materials with specific thermal expansion properties. This compositional parameter optimization allows the composite material to achieve both high thermal conductivity (40-80 W/mK) and thermal expansion coefficient matching (5-15 ppm/K) with semiconductor elements, resolving the contradiction between heat dissipation performance and dimensional stability.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution improves thermal conductivity while maintaining a low coefficient of thermal expansion, effectively promoting heat dissipation and durability in semiconductor devices.

Implementation Method 1

the composite material has a thermal conductivity of 40 W/m. K or more and 80 W/m. K or less

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 2

the composite material has a thermal expansion coefficient of 5 ppm/K or more and 15 ppm/K or less

Methodology Applied
Scientific EffectThermal expansion: Thermal Expansion

Data Source

PatentUS20250388475A1Silicon carbide filler, composite material, and semiconductor device
Publication Date: 2025.12.25 DENSO CORP
  • US20250388475A1 patent drawing
  • US20250388475A1 patent drawing
  • US20250388475A1 patent drawing

AI summary

A composite material includes a continuous phase and a silicon carbide filler. The continuous phase is made of a metal or a synthetic resin. The silicon carbide filler is dispersed in the continuous phase and includes dendritic crystals having a circularity in a cross-sectional view of less than 0.206. A semiconductor device includes a semiconductor element and a bonded member formed from the composite material into a plate shape or a layer shape and bonded to the semiconductor element.