Pattern Formation Using Density-Driven Rinse Liquid
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Solution Overview
Problem
Current pattern forming methods using organic solvent-based developers face challenges in reducing bridge defects during the semiconductor production process, particularly in the formation of precise patterns required for advanced semiconductor elements.
Innovation Solution
A pattern forming method involving the use of a chemically amplified resist composition, exposure to light, development with an organic solvent-based developer, and rinsing with a rinse liquid having a specific gravity greater than the developer, which includes solvents like ether and aromatic ring-containing compounds to enhance the reduction of bridge defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional organic solvent-based developer is used for development, then the development process is simple and fast, but bridge defects occur and pattern precision deteriorates
Solution Approach 1:
The invention changes the physical parameter of the rinse liquid by selecting compounds with specific specific gravity values (greater than the developer). This parameter change enables the rinse liquid to sink below the developer and effectively replace it at the development interface, reducing bridge defects and improving pattern precision without complicating the process
Solution Approach 2:
The rinse liquid acts as an intermediary substance between the developer and the final rinsing stage. By using a liquid with different specific gravity, it mediates the replacement process at the development interface, allowing efficient removal of developer while preventing bridge defects
2Manufacturing precision
If a rinse liquid with lower specific gravity than the developer is used, then the rinsing process is simple, but liquid replacement at the development interface is inefficient and residue defects increase
Solution Approach 1:
The invention changes the specific gravity parameter of the rinse liquid to be greater than that of the developer. This ensures that the rinse liquid naturally sinks and replaces the developer at the development interface through density-driven convection, efficiently removing developer residues and preventing pattern defects
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively reduces bridge defects by ensuring efficient liquid replacement at the development interface, leading to improved pattern precision and reduced residue-related issues during semiconductor production.
Implementation Method 1
a rinse liquid having a specific gravity greater than the developer... efficient liquid replacement at the development interface
Data Source
AI summary
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer.