Deposition Chamber Airflow Monitoring for Temperature and By-Product Control
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Solution Overview
Problem
Existing semiconductor deposition processes face challenges in accurately controlling temperature, analyzing by-product formation, and minimizing by-product formation, leading to inefficient and costly cleaning processes.
Innovation Solution
A semiconductor deposition monitoring device is developed, featuring a supporting table, a chamber with domes, sensors for air information, and a heat exchanger module to adjust air temperature based on sensor data, improving temperature control and by-product analysis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If temperature control in semiconductor deposition equipment is improved, then deposition process accuracy is improved, but device complexity increases due to additional sensors and heat exchanger modules
Solution Approach 1:
The system performs preliminary temperature measurement and adjustment before the deposition process begins. The heat exchanger module pre-cools or pre-heats the air based on sensor readings, ensuring optimal temperature conditions are established before deposition starts, which improves temperature control accuracy without requiring complex real-time control during deposition.
Solution Approach 2:
The patent introduces air as an intermediary medium to transfer heat to or from the deposition chamber. The heat exchanger module adjusts the temperature of air flowing through the chamber, which indirectly controls the deposition temperature. This intermediary approach simplifies the control system compared to direct heating/cooling of the chamber walls or substrate holder.
2Measurement precision
If by-product analysis capability is improved through additional sensors, then analysis accuracy is improved, but device complexity increases
Solution Approach 1:
The optical sensor system is designed to perform multiple functions: measuring the intensity of light transmitted through the chamber to detect by-product formation, monitoring deposition thickness, and analyzing material composition. This multi-functionality allows accurate by-product analysis without adding separate dedicated sensors for each measurement type, thereby reducing overall device complexity.
Solution Approach 2:
The patent replaces complex mechanical sampling and analysis systems with optical sensing. Instead of physically extracting and analyzing by-products through mechanical means, the system uses optical sensors to detect changes in light transmission and absorption, which indicate by-product formation. This substitution simplifies the device while maintaining or improving analysis accuracy.
3Productivity
If cleaning frequency is reduced through better temperature control, then productivity is improved, but temperature control precision requirements increase
Solution Approach 1:
The system implements continuous feedback control where temperature sensors monitor the actual temperature inside the deposition chamber, and the heat exchanger module adjusts air temperature based on these readings. This closed-loop feedback ensures precise temperature maintenance, preventing by-product formation that would require cleaning, thereby improving productivity without compromising precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device enhances the accuracy and reproducibility of temperature control, improves the analysis of by-products formed during deposition, and reduces the frequency and cost of cleaning processes.
Implementation Method 1
a heat exchanger module connected to the conduit and configured to adjust heat of the air based on sensing values received from the plurality of sensors
Implementation Method 2
a laser sensor configured to irradiate a laser beam from an outside of the chamber to detect an intensity of the laser beam penetrated through the chamber
Implementation Method 3
an optical sensor configured to receive the irradiated light and measure an amount of the deposition material formed in the chamber
Data Source
AI summary
The present disclosure provides a semiconductor deposition monitoring device comprising a supporting table, a chamber, a lamp, an optical sensor, a conduit, a plurality of sensors in the conduit, and a heat exchanger. The supporting table supports a deposition target wafer on which a deposition material is deposited. The chamber comprises an upper dome and a lower dome. The lamp emits light to the chamber. The optical sensor receives the irradiated light and measures the deposition material formed in the chamber. The conduit has an inlet conduit through which air is injected into the chamber and an outlet conduit through which the air is discharged from the chamber. The plurality of sensors sense information of the air. The sensed information may be used to control the heat exchanger.