Deposition Angle Limiter for Emissive Display Uniformity
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Solution Overview
Problem
Emissive display devices face issues with non-uniform deposition of material particles due to low incident angles, leading to shadow areas and reduced efficiency and lifetime, as existing methods struggle to effectively increase the incident angle and prevent particle accumulation around nozzles.
Innovation Solution
A deposition apparatus with a deposition angle limiter, comprising low-incident and high-incident angle limiting plates, and angle limiting plates, strategically positioned to control the incident angle of particles and prevent accumulation, thereby improving the uniformity of deposition and ejection rate variability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the incident angle of deposition material particles is increased to reduce shadow areas, then deposition uniformity is improved, but particle accumulation around nozzles occurs
Solution Approach 1:
The deposition angle limiter is divided into multiple functional plates: low-incident angle limiting plates positioned at different heights to block particles at various angles, and high-incident angle limiting plates to allow desired angle particles through. This segmentation enables selective control of particle trajectories without complete nozzle blockage.
Solution Approach 2:
The solution introduces a vertical dimension (height direction) with multiple limiting plates at different heights to control particle incident angles. By arranging limiting plates at varying heights around the nozzle, the system creates a three-dimensional particle filtering structure that allows high-angle particles while blocking low-angle particles that cause accumulation.
2Reliability
If the incident angle of deposition material particles is increased to reduce shadow areas, then lifetime and efficiency of light emitting device are improved, but ejection rate variability increases
Solution Approach 1:
Different regions of the deposition angle limiter have different functions: low-incident angle limiting plates block particles causing accumulation, while high-incident angle limiting plates allow particles that improve deposition uniformity. This local differentiation enables simultaneous achievement of reduced shadow areas and stabilized ejection rates.
Solution Approach 2:
The system controls the incident angle parameter of deposition particles by selectively blocking certain angle ranges while allowing others. By adjusting the positions and heights of limiting plates, the system optimizes the incident angle distribution to improve deposition quality while maintaining ejection rate stability.
3Manufacturing precision
If limiting plates are positioned close to nozzles to control incident angle, then shadow areas are reduced, but device complexity increases
Solution Approach 1:
Multiple limiting plates (low-incident angle and high-incident angle plates) are combined into a single integrated deposition angle limiter structure. This merging reduces the number of separate components while maintaining the functional complexity needed for effective shadow area reduction.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution significantly reduces shadow areas, enhances deposition quality, and improves the ejection rate variability by increasing the incident angle of deposition material particles, thus extending the lifetime and efficiency of light-emitting devices.
Implementation Method 1
The material of the emission layers is vaporized at a deposition source and emitted from the nozzle
Implementation Method 2
allowing a material of the emission layers to pass through the opening of the mask. In this case, particles of the material may be deposited on the substrate with a constant angle while moving in a straight line at a radiated angle
Data Source
AI summary
A deposition apparatus includes: a chamber; a deposition source disposed in the chamber to include nozzles arranged in a first direction; and a deposition angle limiter disposed on the deposition source in the chamber. The deposition angle limiter includes: a low-incident angle limiting plate disposed between adjacent first and second nozzles among the nozzles and spaced apart from the first nozzle by a first height in a height direction intersecting the first direction; and a high-incident angle limiting plate surrounding at least a portion of the first nozzle and spaced apart from the first nozzle by a second height in the height direction. The first nozzle extends in the height direction.