Deposition Apparatus Anode Droplet Capture
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing deposition apparatuses using vacuum arc discharge for forming thin carbon protective films face high maintenance costs and reduced productivity due to droplets adhering to components over a broad range, necessitating extensive droplet removal.
Innovation Solution
A deposition apparatus with a plasma generator that includes a target holder, an anode with an opening, and a capture unit positioned within the anode to capture droplets close to the plasma source, reducing the need for extensive droplet removal from downstream components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the droplet capturing unit is arranged far from the plasma source, then droplets can be captured from a broad range, but droplets adhere to members in the path between the plasma source and capturing unit over a broad range, increasing maintenance cost and decreasing productivity
Solution Approach 1:
The invention changes the spatial arrangement by placing the droplet capturing unit inside the anode cavity rather than far downstream. This dimensional repositioning allows the capturing unit to intercept droplets at the source region, preventing them from adhering to downstream components while maintaining effective capture coverage.
Solution Approach 2:
The droplet capturing unit performs preliminary action by capturing droplets immediately near the plasma source, before they can travel downstream and adhere to other components. This proactive capture approach prevents the harmful effect of widespread droplet adhesion that would require extensive maintenance.
2Quantity of substance
If the droplet capturing unit is arranged far from the plasma source, then droplets can be captured, but a large amount of droplets adhere to members arranged in the path between the plasma source and the capturing unit, increasing maintenance cost
Solution Approach 1:
The capturing unit is repositioned from a downstream location to an upstream location within the anode cavity. This spatial reconfiguration enables droplet capture at the source, eliminating the need to clean downstream components and significantly reducing maintenance costs.
Solution Approach 2:
The harmful droplets are extracted from the plasma flow at the source region by positioning the capturing unit inside the anode cavity. This extraction prevents droplets from contaminating downstream components, thereby reducing maintenance requirements.
3Productivity
If the capture unit is positioned close to the plasma source, then droplets are captured before adhering to downstream components, but the capture unit must be positioned within the anode opening
Solution Approach 1:
The anode serves multiple functions: it provides the positive potential for arc discharge, defines the plasma generation region, and houses the droplet capturing unit within its cavity. This multi-functionality allows the capture unit to be positioned optimally near the plasma source without adding separate structural components.
Solution Approach 2:
The droplet capturing unit is merged with the anode structure by placing it inside the anode cavity. This integration combines the plasma generation function and droplet capture function into a single compact arrangement, simplifying the overall device structure while achieving effective droplet capture near the source.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly reduces the amount of droplets captured by downstream components, decreasing maintenance costs and increasing productivity by capturing droplets near the plasma source, thereby minimizing the frequency of maintenance required for the apparatus.
Implementation Method 1
a plasma generator configured to generate a plasma by arc discharge
Implementation Method 2
a capture configured to capture droplets from the target
Data Source
AI summary
A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.