Deposition Chamber Diffuser Openings for Uniform Plasma Deposition

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing deposition chamber systems face challenges in achieving uniform gas flow and film quality due to non-uniform gas distribution, leading to variations in film thickness and stress across large area substrates, particularly in OLED and flat panel display manufacturing.

Innovation Solution

A diffuser system with a unique design featuring conical and cylindrical openings arranged in rows, creating a hollow cathode gradient for plasma density control and a global flow gradient for uniform gas distribution, enhancing power efficiency and film uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If traditional gas flow distribution is used in deposition chambers, then the system is simple to manufacture and operate, but the gas flow is non-uniform causing non-uniform film deposition

Engineering Contradiction:

Improvefilm uniformityVSAvoiddiffuser structure

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The diffuser surface is segmented into multiple zones with different opening densities - higher density at edges and lower density at center - to compensate for non-uniform gas flow patterns and achieve uniform film deposition across the substrate

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Different regions of the diffuser are given different local properties through varying opening densities and patterns, with edge regions having higher opening density than center regions, allowing each area to compensate for its specific flow characteristics

Inventive Principle:

Principle #3Local quality

2Productivity

If higher power is applied to improve deposition rate, then productivity increases, but film quality and uniformity deteriorate due to edge exclusion and plasma density variations

Engineering Contradiction:

Improvedeposition rateVSAvoidfilm quality

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The diffuser provides locally optimized gas flow distribution with higher opening density at edges to compensate for edge exclusion effects, allowing uniform plasma density and film quality even at higher deposition rates

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The diffuser structure pre-compensates for expected edge exclusion and plasma density variations by adjusting opening densities before the deposition process begins, preventing quality deterioration even when operating at high power levels

Inventive Principle:

Principle #9Preliminary anti-action

3Productivity

If gas flow is increased to improve deposition rate, then productivity increases, but energy consumption increases

Engineering Contradiction:

Improvedeposition rateVSAvoidpower consumption

Core Design Contradiction:

ProductivityVSUse of energy by moving object

Solution Approach 1:

The system changes the gas flow distribution parameters through the diffuser opening patterns, achieving uniform deposition with optimized flow distribution that reduces energy consumption compared to traditional high-flow approaches

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The diffuser system improves film quality and deposition uniformity by optimizing gas flow conductance and plasma density distribution, achieving improved material deposition on large area substrates with reduced edge exclusion and enhanced power efficiency under the same RF power.

Implementation Method 1

A diffuser system with a unique design featuring conical and cylindrical openings arranged in rows, creating a hollow cathode gradient for plasma density control

Methodology Applied

Scientific EffectHollow cathode effect:

Implementation Method 2

creating a global flow gradient for uniform gas distribution

Methodology Applied

Scientific EffectGas flow gradient:

Implementation Method 3

achieving improved material deposition on large area substrates with reduced edge exclusion and enhanced power efficiency under the same RF power

Methodology Applied

Scientific EffectPlasma: Plasma

Data Source

PatentUS12136538B2Deposition chamber system diffuser with increased power efficiency

Publication Date: 2024.11.05 APPLIED MATERIALS INC

AI summary

A diffuser includes a front-side gradient surface formed from a diffuser block, a back-side gradient surface formed from the diffuser block, and opening structures formed from the front-side gradient surface to the back-side gradient surface. Each opening structure includes a conical opening having a first end along the front-side gradient surface and a second end corresponding to an apex at a depth within the diffuser block, and a cylindrical opening formed from the depth to the back-side gradient surface. The opening structures are arranged in rows including a first set of rows and a second set of rows alternately positioned along a length of the diffuser block.