Deposition Mask Composite Structure for Thin-Membrane Rigidity
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Solution Overview
Problem
The existing deposition masks for manufacturing high-resolution organic light emitting diode on silicon (OLEDoS) display panels are prone to breakage due to their thin thickness, which compromises their rigidity and manufacturing yield.
Innovation Solution
A method of manufacturing a deposition mask involves depositing an inorganic layer on a substrate, patterning it to form a mask membrane, thinning the substrate through polishing, and bonding a second substrate with specific openings to enhance rigidity, using materials like silicon oxide and silicon nitride layers, and possibly 3D-printing for structural support.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the mask membrane is made thin to achieve high-resolution deposition, then the deposition precision is improved, but the mask becomes fragile and prone to breakage
Solution Approach 1:
The patent applies composite materials by combining the thin inorganic film mask membrane with a flexible substrate. The mask membrane (made of inorganic materials like silicon nitride or silicon oxide) provides the necessary deposition precision, while the flexible substrate provides mechanical strength and flexibility. This composite structure allows the mask to maintain both thinness for precision and sufficient rigidity to prevent breakage during handling and operation.
2Manufacturing precision
If the mask membrane thickness is reduced for high-resolution patterns, then the manufacturing precision is improved, but the reliability of the mask decreases
Solution Approach 1:
The mask membrane is formed as a composite structure where a thin inorganic film layer (providing high pattern resolution) is deposited on top of a flexible substrate. The inorganic film maintains the necessary thinness for high-resolution patterns, while the flexible substrate underneath provides mechanical support and durability, thereby improving the overall reliability of the mask without compromising pattern resolution.
Solution Approach 2:
The patent uses a flexible substrate as the base structure for the mask. This flexible substrate supports the thin inorganic film mask membrane, providing the necessary mechanical strength and flexibility. The combination allows the mask to maintain thinness for high-resolution patterns while the flexible substrate ensures reliability and prevents breakage during handling and operation.
3Strength
If a rigid substrate is used to increase mask rigidity, then the strength is improved, but the flexibility and adaptability of the mask decreases
Solution Approach 1:
The patent employs a flexible substrate as the base structure for the mask. This flexible substrate provides the necessary flexibility and adaptability for the mask to conform to curved surfaces or flexible displays, while the deposited inorganic film layer provides the required rigidity and structural integrity. The combination of flexible substrate and thin inorganic film achieves both flexibility and sufficient rigidity.
Solution Approach 2:
The mask is constructed as a composite structure where a flexible substrate is combined with a thin inorganic film layer. The flexible substrate provides adaptability and flexibility, while the inorganic film provides rigidity and structural strength. This composite approach allows the mask to maintain both flexibility for conformable applications and sufficient rigidity to prevent breakage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively increases the rigidity of the deposition mask, reducing damage and enhancing manufacturing yield by providing structural support and stability.
Implementation Method 1
depositing an inorganic layer on a front surface of a first substrate and patterning the deposited inorganic layer to form a mask membrane
Implementation Method 2
polishing the first substrate to thin a thickness of the first substrate by performing a designated process on a rear surface of the first substrate
Data Source
AI summary
A method of manufacturing a deposition mask includes: depositing an inorganic layer on a front surface of a first substrate and patterning the deposited inorganic layer to form a mask membrane disposed to correspond to a plurality of cell areas of the first substrate; polishing the first substrate to thin a thickness of the first substrate by performing a designated process on a rear surface of the first substrate; forming a plurality of first openings exposing the mask membrane from the rear surface of the first substrate by etching a portion of the first substrate corresponding to each of the plurality of cell areas from the rear surface of the first substrate; preparing a second substrate and patterning a portion of the second substrate to form a plurality of second openings; and bonding the second substrate to the rear surface of the first substrate.