Deposition Mask Laser Marking for Pattern Alignment
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Solution Overview
Problem
Conventional deposition mask production methods face challenges in forming high-precision opening patterns due to the isotropy of wet etching, leading to unevenness and positional inaccuracies, especially in large-area masks like those for organic electroluminescence display panels.
Innovation Solution
A complex-type deposition mask is created using a thin-board magnetic metal member and a resin film, where laser beam machining forms opening patterns with high precision, and a shallow mark is used as a reference to correct positional displacements during the machining process, ensuring accurate pattern formation across the entire surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If wet etching treatment is used to form opening patterns, then the manufacturing process is simple, but the manufacturing precision deteriorates due to isotropy of wet etching causing unevenness and positional inaccuracies
Solution Approach 1:
The patent replaces the chemical wet etching process with a mechanical/physical laser beam machining process. The laser beam directly removes material to form opening patterns without relying on chemical isotropic etching, thereby achieving high manufacturing precision while maintaining process simplicity.
Solution Approach 2:
The patent changes the fundamental processing parameter from chemical etching to laser beam energy input. By controlling laser beam parameters (energy, pulse duration, scanning speed), the process achieves precise control over opening pattern formation, eliminating the isotropy problem inherent in wet etching.
2Manufacturing precision
If laser beam machining is used to form opening patterns, then the manufacturing precision improves, but the reliability deteriorates due to positional displacement caused by impact of irradiation energy
Solution Approach 1:
The patent applies preliminary action by forming a shallow mark before the main opening pattern formation. This mark serves as a reference position that is established in advance, allowing subsequent opening patterns to be positioned accurately relative to it, thereby compensating for any displacement caused by laser beam impact.
Solution Approach 2:
The patent implements feedback by using the formed shallow mark as a reference for positioning subsequent opening patterns. The system continuously references the mark position to correct and maintain accurate positioning, compensating for displacement effects in real-time during the machining process.
3Productivity
If multiple opening patterns are formed by moving stage and laser optical system step by step, then the productivity improves, but the manufacturing precision deteriorates due to displacement of formation positions
Solution Approach 1:
The patent uses feedback by continuously referencing the shallow mark position during the step-by-step machining process. The imaging device detects the mark, and the system adjusts positioning based on detected position, ensuring that even when moving the stage and optical system, the formation positions remain accurate.
Solution Approach 2:
The patent introduces an intermediary element - the shallow mark - that serves as a stable reference point between the moving stage/optical system and the opening patterns being formed. This intermediary allows the system to maintain precision despite the relative motion required for productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the formation of high-precision opening patterns uniformly across large-area deposition masks, improving positional accuracy and maintaining precision even when the mask is moved during the machining process.
Implementation Method 1
forming a mark that has a specified shape and a specified depth by irradiating a part of the film through the through hole of the mask member with laser beams
Implementation Method 2
forming the opening pattern that penetrates the film by irradiating a predetermined position with laser beams, using the mark as a reference
Data Source
AI summary
A production method for a deposition mask is provided. The production method includes the steps of: forming a mask member having a structure in which a thin-board magnetic metal member having a through hole and a resin film contact tightly with each other; forming a mark that has a specified depth by irradiating a part of the film through the through hole of the mask member with laser beams; and forming an opening pattern that penetrates the film by irradiating a predetermined position with laser beams, using the mark as a reference.