Deposition Mask with Nested Support for Shadow Prevention
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Solution Overview
Problem
Existing deposition masks for organic EL display devices face challenges in preventing shadow generation, which affects the uniform deposition of materials onto substrates due to inclined movement of deposition material relative to the mask.
Innovation Solution
A deposition mask design featuring a mask body with strategically positioned through-holes and a support structure that includes a second through-hole overlapping the first through-holes, ensuring optimal alignment and minimizing shadow generation by controlling the angle of deposition material flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a simple mask body with through-holes is used, then the device complexity is reduced, but shadow generation occurs due to inclined movement of deposition material
Solution Approach 1:
The patent implements a nested structure where a support component with a second through-hole is positioned within the mask body's first through-holes. This nested arrangement allows the support to provide shadow prevention functionality while being integrated within the existing mask body structure, thereby reducing overall device complexity while eliminating shadow generation.
Solution Approach 2:
The support component acts as an intermediary element between the mask body and the substrate. By introducing this intermediate structure with strategically positioned second through-holes, the patent mediates the deposition process to allow inclined deposition material to pass through without creating shadows, thus solving the harmful effect without requiring complete redesign of the mask body.
2Ease of manufacture
If the mask body alone is used for deposition, then the manufacturing process is simplified, but uniform material deposition cannot be achieved due to shadow effects
Solution Approach 1:
The support structure is nested within the mask body, with second through-holes positioned to overlap with first through-holes in plan view. This nested configuration enables uniform material deposition by providing additional pathways for inclined deposition material while maintaining the simplicity of the overall manufacturing process.
Solution Approach 2:
The patent addresses the two-dimensional shadow problem by introducing a third-dimensional solution. The support component extends into the deposition space, creating additional through-holes at different spatial positions that allow deposition material moving at various angles to reach the substrate uniformly, thus solving the precision issue without complicating the manufacturing process.
3Object-affected harmful factors
If through-holes are positioned to allow inclined material flow, then shadow generation is reduced, but the alignment precision between first and second through-holes becomes more difficult to achieve
Solution Approach 1:
The support structure is pre-positioned and fixed within the mask body before the deposition process. The second through-holes are pre-aligned with the first through-holes in plan view, establishing the correct geometric relationship in advance. This preliminary action ensures that inclined deposition material can flow through both sets of holes without shadow generation, while eliminating the need for complex real-time alignment measurements.
Solution Approach 2:
The nested arrangement of second through-holes within the first through-holes provides a built-in alignment reference. The overlapping positioning in plan view creates a natural geometric constraint that simplifies the alignment process, as the support can be positioned relative to the mask body using the through-hole patterns as registration features, thereby reducing measurement precision requirements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents shadow generation, ensuring uniform material deposition and improved precision in patterning organic EL display devices, enhancing the fineness and quality of the display.
Implementation Method 1
a deposition step in which a deposition mask is brought into contact with the substrate for organic EL so as to deposit an organic material onto the substrate for organic EL
Implementation Method 2
the outermost circumference first through-hole has a second surface side connection part which connects the first wall and the second surface... the support is located on a second side which is an opposite side of a first side
Data Source
AI summary
A deposition mask includes: a mask body having two or more first through-holes; and a support disposed on the mask body and having a second through-hole located at a position overlapped with the first through-holes in a plan view. The mask body has a first surface located on an opposite side of a side of the support, and a second surface located on the side of the support. An outermost circumference first through-hole, which is located on an outermost circumference in a plan view of the two or more first through-holes located at the position overlapped with the second through-hole in a plan view, includes a first point which is a center of the outermost circumference first through-hole in a plan view; the second through-hole includes a second point on an outline of the second through-hole, the second point being nearest to the first point.