Deposition Mask Stage Layout for Mask Frame Deformation Control

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Solution Overview

Problem

Existing display manufacturing processes face challenges in controlling the deformation of mask frames during deposition processes, which can affect the accuracy and yield of the deposition process.

Innovation Solution

A deposition mask stage with a stage frame, chucks, and support blocks, including permanent magnetic chucks, is used to control the position and shape of the deposition mask, allowing independent adjustment of chucks and support blocks to correct distortions and maintain precise mask alignment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a mask frame is used to allow the fine metal mask to contact the substrate, then the deposition process can be performed, but the mask frame deforms during the deposition process affecting accuracy

Engineering Contradiction:
Improvedeposition accuracyVSAvoidmask frame shape
Core Design Contradiction:
Manufacturing precisionVSShape

Solution Approach 1:

The mask frame is divided into multiple segments or regions, each supported by independent support blocks. This segmentation allows localized adjustment and compensation of deformations in different areas of the mask frame during the deposition process.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The support blocks are positioned and adjusted before the deposition process begins to pre-compensate for expected thermal expansion and deformation. This preliminary positioning ensures the mask frame maintains its shape despite subsequent thermal effects during deposition.

Inventive Principle:
Principle #10Preliminary action

2Stability of the object's composition

If the mask frame is rigid to maintain shape, then structural stability is improved, but thermal stress causes deformation during deposition

Engineering Contradiction:
Improvemask frame stabilityVSAvoidthermal stress
Core Design Contradiction:
Stability of the object's compositionVSStress or pressure

Solution Approach 1:

Different regions of the mask frame structure are provided with different support characteristics. The support blocks are selectively positioned at critical areas where thermal stress concentration occurs, providing localized compliance while maintaining overall structural stability.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The support blocks can be adjusted to change the mechanical parameters (position, height, support force) of the mask frame during the deposition process, compensating for thermal stress-induced deformations by dynamically adjusting physical parameters.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If support blocks are added to control mask frame deformation, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvedeposition precisionVSAvoidmask stage structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The support blocks are designed to be self-adjusting through thermal expansion and contraction, automatically compensating for mask frame deformation without requiring complex external control systems. The structure serves its own correction function through inherent thermal-mechanical coupling.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enhances the accuracy and yield of the deposition process by enabling precise control over the mask frame's shape, ensuring consistent deposition patterns on substrates.

Implementation Method 1

The chucks may include a permanent magnetic chuck

Methodology Applied
Scientific EffectMagnetic force: Magnetism

Data Source

PatentUS12406870B2Deposition mask stage, display manufacturing apparatus including the same, and display manufacturing method using the same
Publication Date: 2025.09.02 SAMSUNG DISPLAY CO LTD
  • US12406870B2 patent drawing
  • US12406870B2 patent drawing
  • US12406870B2 patent drawing

AI summary

Disclosed is a deposition mask stage comprising a stage frame, chucks combined with the stage frame, and support blocks on a back side of the stage frame. The chucks are spaced apart from each other in a first direction and a second direction that are defined in an extending direction of the stage frame. The first and second directions intersect each other. The support blocks are spaced apart from each other in the first direction and the second direction on the back side of the stage frame.