Deposition Nozzle Array with Variable Inclination Angles

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Solution Overview

Problem

Existing deposition apparatuses face challenges in achieving uniformity of deposition, leading to inefficiencies and material wastage due to non-uniform distribution of deposition materials on substrates.

Innovation Solution

A deposition apparatus with a chamber, crucible, and cover part featuring 2n nozzles of varying inclinations and distances, along with specific inlet and outlet designs, to optimize the distribution and deposition of materials, ensuring uniform coverage and reducing material loss on angle limiting members.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional deposition apparatuses are used with uniform nozzle arrangement, then the device structure is simple, but the deposition uniformity deteriorates

Engineering Contradiction:
Improvedeposition uniformityVSAvoidnozzle arrangement complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies local quality by varying the inclination angles of different nozzles according to their positions. Nozzles at different locations have different inclination angles tailored to their specific positions, creating locally optimized deposition patterns that collectively achieve uniform coverage across the entire substrate surface.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent implements asymmetry by arranging nozzles with non-uniform inclination angles rather than symmetric uniform angles. The nozzle configuration uses asymmetric angle distribution (first angle for some nozzles, second angle for others) to compensate for positional variations and achieve uniform material distribution across the substrate.

Inventive Principle:
Principle #4Asymmetry

2Productivity

If material is deposited at high rates to improve productivity, then deposition speed increases, but material wastage increases

Engineering Contradiction:
Improvedeposition speedVSAvoidmaterial wastage
Core Design Contradiction:
ProductivityVSLoss of substance

Solution Approach 1:

The patent changes the parameters of nozzle inclination angles to optimize material distribution. By adjusting the inclination angles of different nozzles to specific values (first angle and second angle), the system achieves more efficient material utilization, reducing wastage while maintaining high deposition rates through improved coverage uniformity.

Inventive Principle:
Principle #35Parameter changes

3Ease of manufacture

If nozzles are arranged with uniform spacing to simplify manufacturing, then ease of manufacture improves, but deposition uniformity deteriorates

Engineering Contradiction:
Improvenozzle arrangement easeVSAvoiddeposition uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies local quality by varying the inclination angles of different nozzles according to their positions. Nozzles at different locations have different inclination angles tailored to their specific positions, creating locally optimized deposition patterns that collectively achieve uniform coverage across the entire substrate surface.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes the parameters of nozzle inclination angles to optimize material distribution. By adjusting the inclination angles of different nozzles to specific values (first angle and second angle), the system achieves more efficient material utilization, reducing wastage while maintaining high deposition rates through improved coverage uniformity.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus enhances deposition uniformity and material use efficiency by adjusting nozzle angles and distances, resulting in improved straightness of deposition and reduced material deposition on limiting members, thereby optimizing the deposition process.

Implementation Method 1

a material of the source unit may be sublimated or evaporated to be deposited on the target substrate

Methodology Applied
Scientific EffectVapor deposition: Physical Vapour Deposition

Implementation Method 2

a material of the source unit may be sublimated or evaporated to be deposited on the target substrate

Methodology Applied
Scientific EffectEvaporation: Evaporation

Implementation Method 3

a material of the source unit may be sublimated or evaporated to be deposited on the target substrate

Methodology Applied
Scientific EffectSublimation: Sublimation

Data Source

PatentEP3789515B1Deposition apparatus
Publication Date: 2023.08.30 SAMSUNG DISPLAY CO LTD
  • EP3789515B1 patent drawingFigure 1
  • EP3789515B1 patent drawingFigure 2~3
  • EP3789515B1 patent drawingFigure 4

AI summary

A deposition apparatus may comprise a chamber, a crucible in the chamber, a cover part covering the crucible, and 2n nozzles (where 'n' is a positive integer number) protruding from the cover part and arranged in a first direction. Among the 2n nozzles, a distance between an n-th nozzle and an (n+1)-th nozzle may be greater than a distance between a (2n-1)-th nozzle and a 2n-th nozzle.