Deposition Nozzle Cleaning With Heat for Stable Spray Angles
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Solution Overview
Problem
The accumulation of deposition material on the spray angle limiting portion in vacuum deposition processes leads to changes in the spray angle, potentially causing defects and nozzle closures, disrupting the continuous operation of the deposition process in organic light emitting display devices.
Innovation Solution
A depositing apparatus with a cleaning module that includes a heating member movable along a rail and drivers to remove accumulated deposition material from the spray angle limiting portion and nozzles, maintaining the spray angle and ensuring continuous operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a spray angle limiting portion is used to control deposition material spray angle, then deposition precision is improved, but deposition material accumulates on the limiting portion causing spray angle changes and nozzle closure
Solution Approach 1:
The cleaning module performs preliminary cleaning actions before deposition material accumulation causes spray angle changes or nozzle closure. The heating member periodically activates to vaporize and remove accumulated deposition material from the spray angle limiting portion, preventing the harmful effects before they occur.
Solution Approach 2:
The cleaning module enables the spray angle limiting portion to self-clean by using a heating member that vaporizes accumulated deposition material. The system automatically removes its own waste products (accumulated deposition material) without requiring manual intervention or external cleaning processes.
2Stability of the object's composition
If deposition material accumulates on the spray angle limiting portion, then spray angle stability deteriorates, but continuous cleaning is required increasing device complexity
Solution Approach 1:
The cleaning module integrates multiple functions into a single compact unit: the heating member not only cleans the spray angle limiting portion but can also be positioned to clean the deposition nozzle interior. The moving rail system allows the same cleaning module to service multiple locations, reducing overall device complexity while maintaining spray angle stability.
Solution Approach 2:
The invention replaces complex mechanical scraping or wiping cleaning mechanisms with a thermal field-based cleaning approach. The heating member uses thermal energy to vaporize deposition material, eliminating the need for complex mechanical contact-based cleaning systems while effectively maintaining spray angle stability.
3Productivity
If the deposition nozzle is closed by accumulated deposition material, then deposition productivity decreases, but frequent cleaning interruptions increase time loss
Solution Approach 1:
The cleaning module operates periodically during the deposition process to continuously remove deposition material before it can accumulate enough to close the nozzle. This continuous cleaning action maintains uninterrupted deposition operations, preventing productivity loss and eliminating time-consuming cleaning interruptions.
Solution Approach 2:
The heating member rapidly vaporizes accumulated deposition material in short cleaning cycles, quickly removing obstacles before they can significantly impact deposition productivity. The rapid cleaning action minimizes time loss by swiftly addressing accumulation issues rather than allowing them to develop into major interruptions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents changes in the spray angle by removing accumulated deposition material, ensuring consistent deposition quality and continuous process operation, thereby reducing defects in organic light emitting display devices.
Implementation Method 1
a cleaning module disposed between the deposition source and the spray angle limiting portion and heating the deposition material accumulated on the spraying angle limiting portion
Implementation Method 2
depositing a deposition material on the substrate by evaporating or sublimating the deposition material such as an organic material using a deposition source
Implementation Method 3
depositing a deposition material on the substrate by evaporating or sublimating the deposition material
Data Source
AI summary
A depositing apparatus includes a deposition source including at least one deposition nozzle that spray a deposition material, a spray angle limiting portion spaced apart from the deposition source and limiting a spray angle of the deposition material sprayed from the at least one deposition nozzle, and a cleaning module disposed between the deposition source and the spray angle limiting portion and heating the deposition material accumulated on the spraying angle limiting portion.