Thin-Film Deposition Shielding Mechanism for Cleaner Substrate Carriers
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Solution Overview
Problem
Thin-film-deposition equipment requires periodic cleaning to remove waste thin films and pollutants, which can pollute the substrate carrier during the cleaning process, necessitating a shielding mechanism to prevent contamination.
Innovation Solution
A shielding mechanism using two shield members with cavities, driven by a motor via a shaft seal, that can switch between open and shielding states to cover the substrate carrier, preventing pollutant particles from reaching it during cleaning, and allowing deposition processes to proceed without interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the substrate carrier is exposed during cleaning process, then the cleaning effectiveness is improved, but the substrate carrier gets polluted by removed pollutant particles
Solution Approach 1:
The shielding mechanism is divided into two separate shield members (first shield member and second shield member) that can independently move to enclose the substrate carrier. This segmentation allows the cleaning plasma to access the substrate carrier from all directions while the shields can close to prevent pollutant particles from contaminating the carrier during and after cleaning.
Solution Approach 2:
The shield members act as intermediary protective structures between the cleaning plasma and the substrate carrier. They allow the beneficial cleaning action to occur while blocking the harmful pollutant particles generated during cleaning, thus mediating between the cleaning process and the protected substrate carrier.
2Reliability
If solid shield members are used to protect the substrate carrier, then shielding effectiveness is improved, but the loading on the driver increases
Solution Approach 1:
The shield members incorporate through-holes that allow plasma ions to pass through and reach the substrate carrier surface during cleaning. This porous structure maintains the shielding function of blocking pollutant particles while significantly reducing the weight and material required for the shield members, thus reducing driver loading.
Solution Approach 2:
The shield members are constructed as composite structures combining shielding material with through-holes, creating a lightweight yet effective barrier that allows plasma penetration while blocking contaminant particles, optimizing both protective function and weight reduction.
3Object-affected harmful factors
If the shield members block all particles, then protection is improved, but plasma ions cannot reach the substrate carrier for effective cleaning
Solution Approach 1:
The through-holes in the shield members create a porous structure that selectively allows plasma ions to pass through to clean the substrate carrier surface while still providing a barrier against larger pollutant particles, thus maintaining both cleaning effectiveness and protective function.
Solution Approach 2:
The shield members have different functional zones: the through-holes provide localized plasma access pathways while the solid portions provide pollutant blocking. This local differentiation of structure and function allows simultaneous achievement of cleaning and protection objectives.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively prevents pollutant particles from contaminating the substrate carrier during cleaning, ensuring the integrity of the deposition process while reducing the weight and loading on the driver, facilitating efficient operation.
Implementation Method 1
at least one motor connected to the shaft seal and driving the first-shield member and the second-shield member to sway in opposite directions via the shaft seal
Implementation Method 2
The driver includes a shaft seal interconnecting the first-shield member and the second-shield member
Data Source
AI summary
The present disclosure provides a shielding mechanism and a thin-film-deposition equipment using the same, wherein the shielding mechanism includes two shield members and a driver. The driver includes a motor and a shaft seal. The motor interconnects the two shield members via the shaft seal, and such that to drive the two shield members to sway in opposite directions and to switch between an open state and a shielding state. Furthermore, each of the two shield members is formed with at least one cavity, for reducing weights thereof and loading of the motor and the driver.


