Deposition Shutter for Evaporated Material Rate Control
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Solution Overview
Problem
Existing deposition systems lack the ability to accurately adjust and maintain a deposition rate for evaporated materials on flexible substrates over a long period, which is crucial for achieving the desired coating thickness and properties in applications like thin-film solar cells and flexible electronics.
Innovation Solution
A deposition apparatus with a movable shutter and a deposition rate measurement device is used to control the deposition process, allowing the shutter to be positioned in three states: blocking the substrate, allowing deposition on the measurement device, and allowing deposition on both the substrate and measurement device, enabling precise adjustment and control of the deposition rate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a deposition rate measurement device is continuously exposed to evaporated material for monitoring, then deposition rate control accuracy is improved, but the measurement device becomes contaminated and loses functionality over time
Solution Approach 1:
The shutter is positioned in advance to block evaporated material from reaching the measurement device when not in use. The device is prepared for measurement by opening the shutter only when needed, preventing contamination before it occurs.
Solution Approach 2:
The shutter acts as an intermediary element between the evaporated material and the measurement device. It controls the interaction by allowing material to reach the device only when measurement is required, while blocking it during normal operation.
2Reliability
If the shutter remains closed to protect the measurement device, then device reliability is maintained, but deposition rate cannot be measured or controlled
Solution Approach 1:
The shutter transitions from a static closed position to a dynamic state where it can be opened and closed as needed. This allows the system to switch between protection mode and measurement mode, enabling both reliability maintenance and accurate measurement.
Solution Approach 2:
The shutter is opened periodically only when deposition rate measurement is required, rather than remaining continuously open. This periodic exposure allows measurement while minimizing contamination of the measurement device.
3Productivity
If the measurement device is continuously exposed to evaporated material, then deposition rate can be monitored in real-time, but coating thickness uniformity deteriorates due to device interference in the deposition zone
Solution Approach 1:
The shutter serves as a mediator that controls the presence of the measurement device in the deposition zone. It allows the device to be exposed to evaporated material only when measurement is needed, reducing its interference with the uniformity of coating deposition.
4Productivity
If the shutter is opened to allow deposition on the substrate, then productivity is improved, but the measurement device becomes contaminated and measurement accuracy decreases
Solution Approach 1:
The shutter is positioned to block the measurement device from evaporated material before the deposition process begins. This preliminary blocking action prevents contamination that would otherwise occur during productive deposition operation.
Solution Approach 2:
The system segments the deposition zone into areas where substrate deposition occurs and where measurement can occur. The shutter creates a spatial separation that allows productive deposition on the substrate while protecting the measurement device.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This setup allows for accurate adjustment and control of the deposition rate before and during material deposition, ensuring the substrate is coated with the desired thickness and properties, improving the consistency and quality of thin-film coatings.
Implementation Method 1
a deposition source (110) for providing evaporated material
Implementation Method 2
in a thermal evaporation deposition process, evaporated material is deposited onto a substrate
Implementation Method 3
a deposition rate measurement device (130) provided in the material deposition zone (111)
Implementation Method 4
a movable shutter (120) provided in the material deposition zone (111)... configured to be moved in a first position, a second position and a third position
Data Source
Figure 1A~1B
Figure 2~3A
Figure 3B~4A
AI summary
A deposition apparatus (100) for depositing evaporated material onto a substrate (101) is described. The deposition apparatus comprises: a deposition source (110) for providing evaporated material; a material deposition zone (111) provided between the deposition source (110) and the substrate (101); a movable shutter (120) provided in the material deposition zone (111); and a deposition rate measurement device (130) provided in the material deposition zone (111) between the deposition source (110) and the movable shutter (120).