Deposition Source Angle Limiter for Uniform OLED Deposition

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Solution Overview

Problem

Existing deposition methods for organic light-emitting display devices struggle to maintain a high incidence angle of deposition materials and ensure uniformity on the substrate, leading to non-uniform deposition patterns.

Innovation Solution

A deposition source with a crucible, deposition nozzle, and angle limiter configuration that controls the emission angle of deposition materials, allowing for precise control of deposition material distribution and ensuring uniformity on the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a conventional deposition source is used, then the deposition process is simple, but the incidence angle of deposition material cannot be maintained at a high level and uniformity on the substrate cannot be ensured

Engineering Contradiction:
Improvedeposition uniformityVSAvoiddeposition source structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The deposition source is divided into multiple functional components: crucible for material storage, deposition nozzle for controlled discharge, support plate for positioning, and angle limiter for angle control. This segmentation allows each component to perform its specific function optimally, achieving high incidence angle and uniform deposition while maintaining clear functional separation.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The angle limiter acts as an intermediary component between the deposition nozzle and the substrate. It controls and limits the emission angle of deposition material through its geometric structure, ensuring that material reaches the substrate at the desired high incidence angle while preventing excessive angular deviation that would compromise uniformity.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If the emission angle is not controlled, then the device structure is simple, but the deposition material distribution becomes non-uniform on the substrate

Engineering Contradiction:
Improvedeposition uniformityVSAvoidangle control mechanism
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The angle limiter controls the emission angle parameter of deposition material by its geometric configuration. By adjusting the shape, size, and position of the angle limiter, the emission angle can be precisely controlled to maintain high incidence angle, ensuring uniform material distribution on the substrate without requiring complex active control systems.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If the incidence angle is increased to improve deposition uniformity, then material distribution improves, but the control difficulty of the deposition source increases

Engineering Contradiction:
Improvedeposition uniformityVSAvoiddeposition source control
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The angle limiter is designed as a passive geometric constraint that automatically controls the emission angle based on its physical structure. The deposition material naturally follows the path defined by the angle limiter's geometry, eliminating the need for complex active control mechanisms or sophisticated operation systems while maintaining high incidence angle and uniform deposition.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The configuration maintains a high incidence angle and ensures uniform deposition of materials on the substrate, improving the quality and consistency of organic light-emitting display devices.

Implementation Method 1

As the crucible is heated, the deposition material vaporizes and can be emitted through the deposition nozzle

Methodology Applied
Scientific EffectVaporization: Evaporation

Implementation Method 2

an angle limiter disposed on the support plate, where an emission angle of the deposition material discharged from the deposition nozzle is restricted by the angle limiter

Methodology Applied
Scientific EffectGeometric angle restriction: Geometry

Implementation Method 3

a vacuum deposition method can be employed to deposit organic materials or metals used as electrodes onto a substrate

Methodology Applied
Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS20250369093A1Deposition source and deposition apparatus including the same
Publication Date: 2025.12.04 SAMSUNG DISPLAY CO LTD
  • US20250369093A1 patent drawing
  • US20250369093A1 patent drawing
  • US20250369093A1 patent drawing

AI summary

A deposition source includes a crucible accommodating a deposition material and having an open top, a cover plate covering the open top of the crucible, a deposition nozzle disposed on the cover plate, where the deposition nozzle discharges the deposition material, a support plate extending upwardly from the cover plate, and an angle limiter disposed on the support plate. An angle-limiting hole, through which the deposition material passes, is defined in the angle limiter, and a first line extending from one side of the deposition nozzle to a top of the angle-limiting hole is longer than a second line extending from the one side of the deposition nozzle to a point where an imaginary line extending from one side of the angle-limiting hole to the cover plate and an imaginary line extending from the one side of the deposition nozzle parallel to the cover plate meet each other.