Deposition Tool Exhaust Sensing for Dry-Clean Efficiency Control
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Solution Overview
Problem
Current techniques for monitoring the dry-clean operation in semiconductor processing tools are inefficient, requiring multiple read points and excessive use of cleaning gases, leading to inaccurate cleanliness assessment and potential damage to the tools.
Innovation Solution
A cleaning-control subsystem equipped with a gas concentration sensor and a temperature sensor in the exhaust system of the deposition tool monitors the dry-clean operation, providing data to determine the efficiency and effectiveness of the process, allowing for precise control and reduced gas consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple read points are used to monitor dry-clean operation, then measurement coverage is improved, but device complexity and loss of time increase
Solution Approach 1:
The patent extracts the monitoring function from multiple distributed read points and consolidates it into a single read point equipped with sensors. This single point monitors the exhaust stream to infer cleanliness throughout the entire chamber, thereby reducing device complexity while maintaining measurement capability
Solution Approach 2:
The exhaust stream acts as an intermediary carrier that conveys information about cleanliness from the chamber interior to the external sensors. By analyzing the exhaust composition at a single external point, the system infers the cleanliness state of the entire chamber without requiring multiple internal measurement points
2Reliability
If excessive cleaning gas is used, then cleaning effectiveness is improved, but loss of substance and loss of time increase
Solution Approach 1:
The system implements feedback control by continuously monitoring the exhaust stream composition and using this information to adjust cleaning gas flow rates. Sensors detect cleanliness indicators in real-time, and the controller modulates gas supply to maintain effective cleaning while minimizing excessive consumption
Solution Approach 2:
The cleaning gas flow rate is made dynamic rather than static, adjusting in real-time based on monitored cleanliness conditions. The system transitions between different gas flow levels according to the actual cleaning needs detected by sensors, optimizing both effectiveness and resource utilization
3Reliability
If excessive cleaning gas is used, then cleaning effectiveness is improved, but loss of time increases
Solution Approach 1:
Real-time feedback from sensors monitoring the exhaust stream enables the system to detect when cleaning objectives are achieved and immediately terminate the cleaning cycle, preventing unnecessary extension of downtime while ensuring cleaning effectiveness is met
Solution Approach 2:
The monitoring system automatically detects cleaning completion and signals the controller to stop gas supply and end the cycle, enabling self-regulated cleaning operations that optimize time utilization without manual intervention or excessive gas consumption
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the accuracy of the dry-clean operation, reduces cleaning gas consumption, decreases downtime, and increases the yield and throughput of semiconductor products.
Implementation Method 1
A cleaning-control subsystem equipped with a gas concentration sensor and a temperature sensor in the exhaust system of the deposition tool monitors the dry-clean operation
Implementation Method 2
A cleaning-control subsystem equipped with a gas concentration sensor and a temperature sensor in the exhaust system of the deposition tool monitors the dry-clean operation
Data Source
AI summary
Some implementations described herein provide techniques and apparatuses for determining a performance of a dry-clean operation within a deposition tool. A cleaning-control subsystem of the deposition tool may include a gas concentration sensor and a temperature sensor mounted in an exhaust system of the deposition tool to monitor the dry-clean operation. The gas concentration sensor may provide data related to a concentration of a chemical compound in a cleaning gas, where the chemical compound is a bi-product of the dry-clean operation. The temperature sensor may provide temperature data related to an exothermic reaction of the dry-clean operation. Such data may be used to determine an efficiency and/or an effectiveness of the dry-clean operation within the deposition tool.