Design Layout Correcting Method for Double Patterning Hotspot Reduction
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Solution Overview
Problem
In double patterning processes like LELE, conventional design layout correction methods often result in recurring Hotspots, leading to extended design periods due to repeated correction and verification cycles without ensuring the elimination of Hotspots in the desired timeframe.
Innovation Solution
A design layout correcting method that sets a correcting target region and verifying region within the mask patterns, allowing for targeted correction of Hotspots by changing the position, shape, or dividing attributes of design patterns, and re-dividing them to ensure compliance, thereby reducing the occurrence of new Hotspots.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the design layout is corrected and re-divided to eliminate Hotspots, then the manufacturing precision of mask patterns is improved, but the design period is extended due to repeated correction cycles
Solution Approach 1:
The design layout is divided into multiple sub-layouts, and the correction process is segmented into iterative cycles that focus on specific regions. Each correction cycle processes only the necessary portions of the layout rather than the entire design, reducing the time overhead of repeated full-layout processing while maintaining comprehensive Hotspot elimination.
Solution Approach 2:
The system performs preliminary Hotspot detection and identifies all potential Hotspot locations before initiating correction. By pre-processing the layout to locate all Hotspots and preparing correction strategies in advance, the system minimizes the number of iterative correction cycles needed, thereby reducing the overall design period while ensuring thorough correction.
2Reliability
If conventional correction methods are used, then existing Hotspots are addressed, but new Hotspots recur in subsequent verification cycles
Solution Approach 1:
The system implements a feedback mechanism where each correction cycle's results are analyzed to identify patterns and predict locations of new Hotspots. The LCC (Lithography Compliance Check) tool provides feedback on correction effectiveness, and this information is used to adjust subsequent correction strategies, preventing recurrence of Hotspots and improving overall correction efficiency.
Solution Approach 2:
The system performs preliminary analysis to predict where new Hotspots may form as a result of current corrections. By identifying these potential Hotspot locations in advance, the system proactively applies preventive corrections in subsequent cycles, eliminating the root causes before new Hotspots can form, thereby improving both reliability and productivity.
Data Source
AI summary
In a design layout correcting method of an embodiment, a design layout of a circuit pattern is divided to a first mask pattern and a second mask pattern. The mask pattern of the pattern defect area of the first or second mask pattern is set as the correcting target pattern. A correcting target region and a verifying region are set within the first or second mask pattern. The correcting target pattern is corrected within the correcting target region, and the first and second mask patterns are verified within the verifying region.