Detachable Internal Electrode Layout for Plasma Partition Wall Protection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing plasma processing apparatuses with internal partition walls suffer from damage and reduced lifespan due to ion sputtering and etching, particularly when using hydrogen-containing gases, leading to structural changes and stress in silica glass components.
Innovation Solution
The apparatus incorporates a detachable internal electrode and external electrodes to generate plasma, minimizing damage to the partition wall and extending its lifespan by allowing periodic replacement of the insulating tube, while using synthetic quartz for enhanced durability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If parallel-plate type plasma electrodes are arranged on opposite sidewalls of the plasma partition wall, then plasma can be generated in the internal space, but the partition wall suffers from ion sputtering and etching damage
Solution Approach 1:
The plasma generation system is segmented into two separate components: an internal electrode placed inside the internal space and an external electrode placed outside the partition wall. This segmentation allows the plasma generation function to be maintained while preventing direct ion bombardment of the partition wall, as the internal electrode can be removed when not in use.
Solution Approach 2:
The internal electrode is designed to be movable between an inserted state (where it contacts the bottom surface of the internal space) and a removed state (where it is taken out through the opening). This dynamic configuration allows the system to switch between plasma generation mode and maintenance mode, preventing cumulative damage to the partition wall.
2Reliability
If the internal electrode is fixed in the internal space, then plasma generation is stable, but replacement and maintenance of the electrode becomes difficult
Solution Approach 1:
The internal electrode is designed with movable characteristics, allowing it to be inserted into and removed from the internal space through the opening. This dynamic design enables easy replacement and maintenance while maintaining stable plasma generation during operation, as the electrode can be securely positioned when inserted.
Solution Approach 2:
The internal electrode is designed as a replaceable component that can be discarded after wear or damage and recovered/replaced by inserting a new electrode through the opening. This approach simplifies maintenance without requiring complex disassembly of the partition wall or internal space structure.
3Strength
If synthetic quartz is used for the partition wall, then durability is enhanced, but distortion and stress still occur due to hydrogen-containing gases
Solution Approach 1:
The internal electrode is extracted or removed from the internal space when plasma generation is not required. This extraction prevents continuous ion bombardment of the partition wall, reducing cumulative damage and structural changes even when synthetic quartz is used. The partition wall is only exposed to plasma conditions during active processing cycles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents distortion and damage to the partition wall, prolongs the reactor's lifespan, reduces maintenance costs, and maintains operational efficiency by isolating the internal electrode from direct plasma exposure.
Implementation Method 1
an internal electrode that passes through the partition wall, is detachably and airtightly inserted into the internal space, and is supplied with RF power
Implementation Method 2
Existing plasma processing apparatuses with internal partition walls suffer from damage and reduced lifespan due to ion sputtering and etching
Data Source
AI summary
A plasma processing apparatus includes a processing container having an opening in a sidewall, a partition wall that covers the opening and forms an internal space communicating with an inside of the processing container, an internal electrode that passes through the partition wall, is detachably and airtightly inserted into the internal space, and is supplied with RF power, and an external electrode provided outside the partition wall.


