Detection Means Alignment Using Adjustment Marks for Substrate Holders
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Solution Overview
Problem
Existing alignment methods in the semiconductor industry fail to meet increasing accuracy requirements due to imprecise positioning of optical detection elements relative to substrate holders, leading to alignment errors and high rejection rates.
Innovation Solution
A device and method that adjusts detection means by using a substrate holder with regularly arranged elevations and adjustment marking fields, allowing for precise alignment of detection elements relative to the substrate holder, compensating for angular errors without requiring additional reference wafers or systems.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If optical detection elements are positioned relative to substrate holders, then alignment can be performed, but imprecise positioning leads to alignment errors and fails to meet increasing accuracy requirements
Solution Approach 1:
The patent introduces adjustment marking fields as an intermediary reference system between the detection means and substrate holder. These marking fields provide precise reference points that mediate the positioning relationship, allowing the detection means to be accurately aligned without requiring direct precise positioning relative to the substrate holder itself.
Solution Approach 2:
The patent replaces mechanical positioning methods with optical detection and adjustment methods. Instead of relying on mechanical precision of the detection means positioning, the system uses optical detection of adjustment marks to determine and correct angular and positional errors, substituting mechanical precision requirements with optical measurement capabilities.
2Measurement precision
If adjustment movements are performed to position detection elements, then alignment can be achieved, but parasitic movements occur that cause deviations from ideal movement and reduce alignment accuracy
Solution Approach 1:
The patent performs preliminary adjustment by detecting adjustment marks before the actual alignment process. The system detects the angular error and position error in advance, calculates correction values, and pre-adjusts the detection means or substrate holder positioning. This preliminary action eliminates the need for repeated adjustment movements during the alignment process, preventing parasitic movements from occurring.
3Measurement precision
If multiple adjustment movements are performed to achieve precise alignment, then alignment accuracy can be improved, but the complexity of the adjustment process increases and productivity decreases
Solution Approach 1:
The patent implements a feedback mechanism where the detection means detects adjustment marks, determines angular and positional errors, calculates correction values, and applies adjustments. This closed-loop feedback system achieves precise alignment in a systematic manner, reducing the number of iterative adjustments needed compared to trial-and-error methods, thereby improving productivity while maintaining high accuracy.
Data Source
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AI summary
The invention relates to a method and a device for adjusting a detection means based on adjustment marks arranged one above the other.