Developer Feeder with Segmented Exhaust Ports for Uniform Substrate Coverage
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Solution Overview
Problem
Conventional developing apparatuses for semiconductor wafers and glass substrates face challenges in efficiently supplying developers due to deformation of the developer stream, leading to uneven coverage and increased consumption, as the belt-like developer shape narrows or splits with variations in flow rate, resulting in gaps on the substrate surface.
Innovation Solution
A developing apparatus with a developer feeder having multiple exhaust ports arranged in a row, a moving mechanism that maintains the direction of exhaust ports towards the substrate center, and a controller to ensure the developer streams impinge spirally and uniformly over the substrate, reducing deformation and gaps by controlling the spin holder and moving mechanism to manage the positional relationship of the developer streams.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of substance
If the developer is supplied in a belt-like shape spirally to the substrate, then the developer consumption is reduced, but the belt-like shape of the developer narrows or splits into two or more strips with variations in flow rate, making it difficult to cause the developer to impinge in desired positions or ranges on the substrate
Solution Approach 1:
The developer supply system is segmented into multiple independent nozzles arranged in an arc instead of a single belt-like supply. Each nozzle independently dispenses developer to specific regions on the substrate, maintaining precise impingement positions while reducing overall consumption through targeted delivery.
Solution Approach 2:
The developer supply transitions from a two-dimensional belt-like continuous supply to a multi-point arc arrangement in three-dimensional space. The nozzles are positioned at different radial distances from the substrate center, creating a distributed supply pattern that maintains shape stability and precise positioning.
2Reliability
If the developer is supplied spirally to cover the entire substrate surface, then the developer can be supplied without gaps, but the developer cannot be supplied efficiently and consumption is increased when supplying in excess quantity to avoid gaps
Solution Approach 1:
The substrate surface is divided into multiple radial zones, each served by a dedicated nozzle positioned at a specific radial distance. This segmentation allows precise control of developer distribution across different regions, ensuring complete coverage without excessive supply, thereby reducing overall consumption while maintaining reliability.
Solution Approach 2:
Each nozzle is optimized for its specific radial position and supplies developer tailored to the local requirements of its corresponding substrate region. This localized supply approach ensures uniform coverage throughout the substrate while minimizing waste by avoiding excessive supply in any single area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution allows for efficient developer distribution over the entire substrate surface, reducing consumption by maintaining a steady developer shape and ensuring consistent impingement positions and ranges, thereby minimizing gaps and optimizing developer usage.
Implementation Method 1
a spin holder for spinnably holding the substrate
Implementation Method 2
a developer feeder having a plurality of exhaust ports arranged in a row for discharging a developer
Implementation Method 3
a moving mechanism for moving the developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of the exhaust ports in the one direction
Data Source
AI summary
A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.