Developer Mixing Control for Precise Photolithography Temperature
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Solution Overview
Problem
The temperature of the developer used in photolithography processes affects critical dimensions and line edge roughness of the photoresist pattern, and optimal temperatures vary based on the type of photoresist, necessitating precise temperature control during developer dispensing.
Innovation Solution
A developer supply device with multiple pipes and flow rate controllers to mix developers at different temperatures, using sensors to adjust flow rates based on measured temperature, ensuring accurate temperature control of the mixed developer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single temperature developer supply system is used, then the system structure is simple, but the temperature control precision is insufficient for different photoresist types
Solution Approach 1:
The developer supply system is segmented into multiple independent temperature control channels (first temperature control channel and second temperature control channel), each capable of supplying developer at different temperatures. This allows selective supply of developers at different temperatures based on photoresist type requirements, thereby improving temperature control precision without requiring a complete system redesign.
Solution Approach 2:
The mixed developer supply system is designed to handle multiple temperature requirements through a unified mixed developer supply channel. The system can supply both high-temperature and low-temperature developers through the same dispensing mechanism, making the system multi-functional and adaptable to different photoresist types while maintaining structural efficiency.
2Manufacturing precision
If developer temperature is not precisely controlled, then the system operation is simple, but the critical dimension and line edge roughness deteriorate
Solution Approach 1:
Temperature sensors are installed in both the first and second temperature control channels to detect the actual temperatures of the developers being supplied. This feedback information is transmitted to the controller, which automatically adjusts the flow rates or heating/cooling parameters to maintain the desired temperature precision, thereby ensuring consistent critical dimension and line edge roughness control.
Solution Approach 2:
The system dynamically changes the temperature parameter of the supplied developer by selecting from different temperature control channels or adjusting the mixing ratio in the mixed developer supply channel. This allows optimization of the developer temperature parameter to match the specific requirements of different photoresist types, thereby improving manufacturing precision.
3Adaptability or versatility
If multiple temperature channels are implemented, then temperature adaptability improves, but the device complexity increases
Solution Approach 1:
The first temperature control channel and second temperature control channel are merged into a unified mixed developer supply channel through a mixing mechanism. This allows the system to provide multiple temperature options while using a shared dispensing infrastructure, thereby improving temperature adaptability without proportionally increasing the overall device complexity.
Solution Approach 2:
A mixed developer supply channel acts as an intermediary between the multiple temperature control channels and the final dispensing point. This intermediary mechanism allows flexible combination of developers at different temperatures to achieve the desired temperature profile, reducing the need for separate complete supply lines for each temperature option.
4Measurement precision
If real-time temperature monitoring is added, then temperature control accuracy improves, but the system complexity and cost increase
Solution Approach 1:
Temperature sensors are integrated into the first and second temperature control channels to provide real-time temperature monitoring. The sensor outputs are connected to the controller, which uses this feedback information to automatically adjust the temperature control parameters, thereby improving measurement precision while maintaining manageable system complexity through automated control.
Solution Approach 2:
The temperature control system is designed to be self-regulating through the feedback mechanism. The controller automatically adjusts the temperature parameters based on sensor readings without requiring external manual intervention, thereby improving measurement and control accuracy while minimizing the operational complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Achieves precise temperature control of the developer, stabilizing critical dimensions and line edge roughness, and optimizing exposure dose by adjusting developer temperature in real-time.
Implementation Method 1
a first pipe configured to supply a developer having a first temperature, a second pipe configured to supply the developer having a second temperature lower than the first temperature
Implementation Method 2
a mixer fluidly connected to the first pipe and the second pipe and configured to mix the developer having the first temperature and the developer having the second temperature
Implementation Method 3
a mixer fluidly connected to the first pipe and the second pipe and configured to mix the developer having the first temperature and the developer having the second temperature
Implementation Method 4
a temperature sensor configured to measure a temperature of the mixed developer
Implementation Method 5
a controller configured to control at least one of the first flow rate controller and the second flow rate controller based on the temperature of the mixed developer measured by the temperature sensor
Data Source
AI summary
Example embodiments are directed to a developer supply device including a first pipe supply a developer of a first temperature, a second pipe supply the developer of a second temperature, a mixer fluidly connected to the first pipe and the second pipe and mix the developer to obtain a mixed developer, a first flow rate controller control a flow rate of the developer into the mixer, a second flow rate controller control a flow rate of the developer into the mixer, a nozzle to dispense the mixed developer on a target substrate, a third pipe fluidly connected to the mixer and the nozzle to supply the mixed developer; a temperature sensor to measure a temperature of the mixed developer, and a controller to control the first flow rate controller or the second flow rate controller based on the temperature.