Developing Fluid for Super Fine Resist Patterns
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Solution Overview
Problem
Current methods for forming fine resist patterns, such as nanoimprinting, are limited by the resolution of developing fluids like n-amyl acetate and propylene glycol monomethyl ether acetate, which cannot achieve patterns finer than 18 nm without maintaining cold temperatures, leading to increased equipment costs and reduced pattern quality.
Innovation Solution
A method using a developing fluid with a carboxylic acid compound as a main component, specifically a carboxylic acid ester with branched chain alkyl groups and a total carbon number of 8 or greater, such as isobutyl butyrate or isoamyl isobutyrate, to develop non-chemically amplified resist without cold temperatures, allowing for the formation of super fine resist patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional developing fluids (n-amyl acetate, propylene glycol monomethyl ether acetate) are used, then the development process is simple and equipment cost is low, but the resolution is limited to 18 nm or larger
Solution Approach 1:
The invention changes the chemical parameters of the developing fluid by using carboxylic acid esters with specific molecular structures (branched chain alkyl groups with total carbon number 8 or greater) instead of conventional developing fluids. This parameter change in the fluid's molecular structure enables super fine pattern formation at 15 nm resolution without requiring cold temperature equipment, thus improving resolution while avoiding increased device complexity
Solution Approach 2:
The invention employs composite developing fluids formed by mixing carboxylic acid esters with specific molecular structures in particular ratios (e.g., isobutyl butyrate and 2-methylbutyl 2-methylbutyrate in 1:1 to 4:1 weight ratios). This composite approach combines the benefits of different molecular structures to achieve both high resolution and pattern stability without requiring complex equipment
2Manufacturing precision
If cold temperature development is used, then resolution can be improved to approximately 18 nm, but equipment cost increases due to temperature control requirements
Solution Approach 1:
The invention changes the temperature parameter of the development process by using developing fluids with specific molecular structures that enable high resolution development at room temperature. The carboxylic acid esters with branched chain alkyl groups (total carbon number 8 or greater) provide sufficient solubility contrast and pattern stability without requiring cold temperature control, thereby achieving 15 nm resolution while avoiding increased energy consumption and equipment cost
3Manufacturing precision
If conventional developing fluids are used, then the process is simple and cost-effective, but pattern stability and solubility contrast are insufficient for super fine patterns
Solution Approach 1:
The invention changes the chemical composition parameters of the developing fluid by selecting carboxylic acid esters with specific molecular structures (branched chain alkyl groups, total carbon number 8 or greater). These structural parameters provide optimal solubility contrast and pattern stability for super fine pattern formation. Examples include isobutyl butyrate, 2-methylbutyl 2-methylbutyrate, and their mixtures in specific ratios, which achieve both high pattern stability and relatively simple processing
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the formation of super fine resist patterns down to 15 nm scale without the need for cold temperatures, improving resolution and reducing pattern collapse, while maintaining cost-effectiveness by using a developing fluid with a complex branched structure that enhances solubility contrast and penetration control.
Implementation Method 1
patterns are formed by a difference in dissolution rates of the exposed portions and unexposed portions with respect to with respect to a solvent
Data Source
AI summary
A method for developing a non chemically amplified resist employs a developing fluid having a carboxylic acid compound, which is a carboxylic acid ester having branched chain alkyl groups and a total carbon number of 8 or greater, as a main component. It is particularly preferable for the carboxylic acid compound to be at least one of isobutyl butyrate, butyl isobutyrate, isobutyl isobutyrate, isoamyl isobutyrate, and 2-methylbutyrate 2-methylbutyl. It is also preferable for the non chemically amplified resist to be a resist having a copolymer of an α-chloroacrylate ester compound and an α-methylstyrene compound as a main component.