Development Nozzle Cleaning with Gas Bubbles
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Solution Overview
Problem
Conventional development processing devices face issues with development liquid nozzle contamination leading to defects on substrates, as residual development liquid and foreign matter can adhere to the nozzle, causing improper discharge and subsequent defects on the substrate during the development process.
Innovation Solution
A development processing device is designed with a cleaning processor that uses a cleaning liquid with gas bubbles to remove contaminants from the development liquid nozzle after it has discharged the development liquid on the substrate, ensuring efficient cleaning by colliding forces and pressure waves, and preventing the cleaning liquid from adhering to the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the development liquid nozzle is cleaned using a cleaning liquid after discharging development liquid, then the nozzle is cleaned, but the cleaning liquid may drop on the substrate causing development defects
Solution Approach 1:
The patent extracts the harmful cleaning liquid from the nozzle by introducing gas bubbles that rise to the surface, carrying the cleaning liquid and contaminants away from the nozzle tip, preventing drops on the substrate
Solution Approach 2:
Gas bubbles serve as an intermediary medium between the cleaning liquid and the external environment, enabling the cleaning liquid to be removed from the nozzle without direct contact or gravity-driven dripping onto the substrate
2Reliability
If the development liquid nozzle is not cleaned, then development defects occur due to contamination, but cleaning requires additional processing time
Solution Approach 1:
The cleaning operation is integrated into the existing nozzle waiting period between substrate processing cycles, making the cleaning action continuous with the operational rhythm rather than an interruptive step
Solution Approach 2:
The cleaning system uses the nozzle's own position and the natural rise of gas bubbles to achieve self-cleaning, requiring minimal external intervention or complex mechanical cleaning mechanisms
3Manufacturing precision
If foreign matter adheres to the development liquid nozzle, then proper discharge of development liquid is prevented, but removing foreign matter requires effective cleaning mechanisms
Solution Approach 1:
The patent uses pneumatic action through gas bubbles introduced into the cleaning liquid to create lifting and flushing forces that remove foreign matter from the nozzle, replacing complex mechanical scraping or ultrasonic cleaning mechanisms
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents development defects on the substrate by ensuring the development liquid nozzle is thoroughly cleaned, preventing residual liquid and foreign matter from causing issues during subsequent processing steps.
Implementation Method 1
the cleaning processing for the development liquid nozzle is performed using the cleaning liquid with the gas bubbles mixed therein
Implementation Method 2
the contaminants adhering to the development liquid nozzle are broken up by the pressure wave generated by the movement, collision and the like of the gas bubbles
Implementation Method 3
the gas bubbles adhere to the contaminants and strips the contaminants off the development liquid nozzle
Data Source
AI summary
A slit nozzle is moved by a nozzle lifting/lowering mechanism and a nozzle sliding mechanism relative to substrates held in a substantially horizontal attitude by spin chucks. A development liquid is discharged on each substrate from a discharge port of the slit nozzle such that development processing for the substrate is performed. After the development liquid is discharged, the slit nozzle is moved to a waiting position excluding positions over the substrates held by the spin chucks. In waiting pods provided at the waiting positions, cleaning processing for the slit nozzle is performed by a cleaning liquid with gas bubbles mixed therein.