Device Substrate Spacer Height Control via Patterned Light-Shielding Layer

The patent replaces expensive, specialized masks (phase shift masks, half tone masks, gray tone masks) with a general mask that can be used for multiple purposes. The general mask is a cost-effective, reusable component that eliminates the need for multiple specialized masks, thereby reducing production costs while maintaining the capability to fabricate spacers with different heights through differential exposure doses.

The patent introduces a general mask that serves multiple functions: it can be used to fabricate both main spacers and secondary spacers with different heights using the same mask, eliminating the need for separate specialized masks. This multi-functional approach simplifies the manufacturing process and reduces costs while maintaining precision in height difference control through controlled exposure parameters.

The patent extracts the essential function of specialized masks (creating height differences in spacers) and separates it from the complex mask structures. By using a simple general mask combined with controlled exposure doses, the patent eliminates the need for complex phase shift masks, half tone masks, or gray tone masks, thereby simplifying the overall manufacturing process while maintaining the capability to create spacers with different heights.

The patent controls the height difference of spacers by changing exposure parameters (exposure dose, wavelength) rather than changing the mask structure. This approach simplifies the device complexity by using a general mask with fixed transmittance, where the desired height differences are achieved through parameter adjustments in the exposure process rather than through complex mask designs.