Diamond Fluorescent Sensor for Lithography Dose Monitoring
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Solution Overview
Problem
Current fluorescence-based sensor apparatuses in lithographic apparatuses face challenges such as temperature-induced sensitivity drift and angular dependence, particularly with YAG:Ce-based systems, which require exhaustive calibration and are not suitable for high-precision dose control in lithographic processes.
Innovation Solution
The use of diamond fluorescent material in sensor apparatuses, which absorbs deep ultraviolet (DUV) radiation and emits visible radiation, allowing for accurate monitoring with reduced sensitivity drift due to its high thermal conductivity and independence from magnetic fields, enabling precise dose control and stability across varying angles and exposure conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If YAG:Ce-based fluorescence sensor apparatuses are used for radiation monitoring, then the sensor can detect radiation dose, but the sensor exhibits temperature-induced sensitivity drift and angular dependence
Solution Approach 1:
The patent changes the material parameter from YAG:Ce-based fluorescent material to diamond fluorescent material. This material substitution fundamentally alters the sensor's physical properties, eliminating temperature-induced sensitivity drift and angular dependence while maintaining radiation dose measurement capability, thereby resolving the contradiction between measurement precision and reliability
Solution Approach 2:
The patent employs diamond fluorescent material, which combines the beneficial properties of high thermal conductivity, radiation hardness, and stable fluorescence characteristics. This composite approach creates a sensor apparatus that maintains measurement precision while achieving superior reliability across varying operational conditions
2Measurement precision
If YAG:Ce-based sensor apparatuses are used, then radiation monitoring is possible, but exhaustive calibration is required due to sensitivity drift
Solution Approach 1:
The diamond fluorescent material inherently maintains stable sensitivity without requiring external calibration adjustments. The material's physical stability and resistance to temperature-induced drift enable the sensor to self-maintain its calibration state, eliminating the need for exhaustive calibration procedures while preserving measurement precision
Solution Approach 2:
By changing the fluorescent material to diamond, the patent fundamentally alters the sensor's operational characteristics, transitioning from a system requiring extensive calibration to one that maintains stable performance without calibration intervention, thereby reducing device complexity while preserving measurement accuracy
3Measurement precision
If conventional fluorescent sensor apparatuses are used, then radiation monitoring can be performed, but high precision dose control is not achieved due to sensitivity drift
Solution Approach 1:
The patent applies parameter changes by substituting the fluorescent material with diamond, which has superior thermal and radiation stability. This material change enables the sensor to maintain consistent sensitivity across varying temperature and radiation conditions, simultaneously achieving high precision dose control and reliable sensitivity consistency
Solution Approach 2:
The patent utilizes diamond fluorescent material, a composite solution that combines high thermal conductivity, radiation hardness, and stable fluorescence properties. This material composition enables the sensor to achieve both high precision dose control and reliable sensitivity consistency, resolving the contradiction between these two performance requirements
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Diamond fluorescent material-based sensor apparatuses provide stable and accurate radiation monitoring, reducing sensitivity drift and the need for extensive calibration, ensuring high precision and reliability in lithographic processes by effectively managing heat and maintaining consistent sensitivity across different angles and exposure conditions.
Implementation Method 1
a first sensor apparatus comprising a diamond fluorescent material configured to absorb the first radiation and to emit second radiation being representative of the first radiation, said second radiation being of a second wavelength
Implementation Method 2
a first sensor apparatus comprising a diamond fluorescent material configured to absorb the first radiation
Data Source
AI summary
A lithographic apparatus including a monitoring apparatus and an associated monitoring apparatus. The monitoring apparatus is configured for monitoring first radiation of a first wavelength. The monitoring apparatus has a first sensor apparatus including a diamond fluorescent material configured to absorb the first radiation and to emit second radiation being representative of the first radiation, the second radiation being of a second wavelength; and a second sensor apparatus configured to sense the second radiation.