Diamond Indenter Coating for Tribochemical Reaction Analysis

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Solution Overview

Problem

Current methods for testing interfacial tribochemical reactions between abrasives and diamond wafers are limited by their inability to analyze interactions at the atomic level, lack of versatility in testing specific material pairs, and failure to detect weak reactions.

Innovation Solution

A method involving coating a diamond indenter with active metal or metal oxide abrasive particles using magnetron sputtering, scratching the diamond wafer, and analyzing the chemical components with a scanning probe micro Raman spectrometer to study the interfacial tribochemical reaction.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If macro-contact testing methods are used to study interfacial tribochemical reactions, then the testing setup is simple, but the analysis cannot reach atomic levels

Engineering Contradiction:

Improveanalysis precisionVSAvoidtesting system complexity

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The patent transitions from macro-scale contact testing to nano-scale testing by using a diamond indenter with radius of curvature between 1-50 μm. This dimensional change enables atomic-level analysis of interfacial tribochemical reactions while maintaining controllable testing conditions through the nano scratch tester apparatus

Inventive Principle:

Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent introduces a diamond indenter as an intermediary tool that bridges macro testing equipment and atomic-level analysis. The indenter's small radius allows it to concentrate force at the atomic scale while being operable through standard nano scratch testers, enabling high-precision measurement without requiring overly complex testing systems

Inventive Principle:

Principle #24Intermediary (Mediator)

2Adaptability or versatility

If specific material pair testing methods are used, then the testing protocol is standardized, but the method cannot be widely applied to different material combinations

Engineering Contradiction:

Improvematerial pair applicabilityVSAvoidtesting method implementation

Core Design Contradiction:

Adaptability or versatilityVSEase of manufacture

Solution Approach 1:

The patent creates a universal testing method that can evaluate interfacial tribochemical reactions between diamond and various abrasive materials (metal oxides, ceramics, carbides, nitrides). The standardized nano scratch testing protocol combined with Raman spectroscopy analysis provides a multi-functional approach applicable to diverse material pairs while maintaining ease of implementation through existing equipment

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Productivity

If traditional chemical mechanical polishing is used for new semiconductor materials, then the polishing method is familiar and easy to implement, but processing efficiency is low and surface quality requirements are difficult to meet

Engineering Contradiction:

Improveprocessing efficiencyVSAvoidsurface quality

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The patent changes the fundamental parameters of the polishing process by transitioning from chemical mechanical polishing to abrasion-based removal mechanisms. By controlling contact load, scratching speed, and abrasive properties at the nano scale, the method achieves both high processing efficiency and superior surface quality that meets stringent semiconductor manufacturing requirements

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method allows for controlled analysis of the interface interaction between the abrasive and diamond wafer, providing insights into the tribochemical reaction and enhancing the efficiency of ultra-precision machining of semiconductor wafers.

Implementation Method 1

coating a layer of active metal abrasive (i.e., active metal abrasive particles) or a layer of metal oxide abrasive (i.e., metal oxide abrasive particles) on a tip surface of a diamond indenter of a nano scratch tester by magnetron sputtering

Methodology Applied

Scientific EffectMagnetron sputtering: Sputtering

Implementation Method 2

putting the scratched diamond wafer on a scanning probe micro Raman spectrometer, and analyzing chemical components of a scratching section of the scratched diamond wafer

Methodology Applied

Scientific EffectRaman spectroscopy:

Implementation Method 3

scratching a surface of the diamond wafer using the diamond indenter to obtain a scratched diamond wafer

Methodology Applied

Scientific EffectAbrasion: Abrasion

Implementation Method 4

testing an interfacial tribochemical reaction between abrasive and a diamond wafer

Methodology Applied

Scientific EffectTribochemical reaction:

Data Source

PatentUS11982650B2Method for testing interfacial tribochemical reaction between abrasive and diamond wafer

Publication Date: 2024.05.14 HUAQIAO UNIVERSITY

AI summary

A method for testing an interfacial tribochemical reaction between a diamond wafer and active metal abrasive or metal oxide abrasive is provided. A surface of a diamond indenter used in a nano scratch tester is coated with a layer of the active metal abrasive or the metal oxide abrasive with uniform and controllable thickness by magnetron sputtering, and an interface interaction between the layer of the active metal abrasive or the metal oxide abrasive and the diamond wafer is controlled by a scratch test of the diamond wafer. Chemical components of an interaction section on a surface of the diamond wafer are analyzed by the scanning probe micro Raman spectrometer.