Diamond-Coated Substrate Recess Structure for Direct Plasma Deposition
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Solution Overview
Problem
Conventional in-liquid plasma chemical vapor deposition methods require an intermediate layer on substrates, which complicates the formation of high-quality diamond coatings and reduces production efficiency.
Innovation Solution
A diamond formation device with a substrate having at least one recess on its surface, allowing direct diamond formation without the need for an intermediate layer, utilizing an in-liquid plasma chemical vapor deposition method where the substrate is placed in a reaction vessel with a carbon source-containing liquid and an electrode capable of generating plasma.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an intermediate layer is separately provided on a substrate using conventional in-liquid plasma chemical vapor deposition method, then diamond can be formed on the substrate, but the process complexity increases and production efficiency decreases
Solution Approach 1:
The invention extracts and eliminates the intermediate layer from the conventional diamond formation process. By providing a substrate with a recess structure, the patent enables direct diamond formation on the substrate surface without requiring a separate intermediate layer, thus simplifying the overall process while maintaining diamond formation quality
Solution Approach 2:
The substrate is pre-formed with a recess structure before the diamond formation process. This preliminary action creates favorable conditions for direct diamond nucleation and growth in the recess regions, eliminating the need for subsequent intermediate layer deposition
2Reliability
If an intermediate layer is separately provided on a substrate, then diamond can be formed on the substrate, but production efficiency is reduced due to additional processing steps
Solution Approach 1:
The intermediate layer step is extracted and removed from the process flow. The recess structure on the substrate directly enables diamond formation, reducing the number of processing steps and improving production efficiency
Solution Approach 2:
The substrate preparation and diamond formation processes are merged into a more integrated flow. By forming the recess structure on the substrate beforehand, the patent combines what were previously separate steps (intermediate layer deposition and diamond formation) into a more efficient single process
3Reliability
If various formation conditions are adjusted to provide an intermediate layer, then diamond can be formed on the substrate, but the process becomes difficult to control stably and repeatedly
Solution Approach 1:
The recess structure is pre-formed on the substrate, which inherently provides the necessary conditions for diamond nucleation. This eliminates the need for complex intermediate layer deposition processes and their associated control parameters, making the process more stable and repeatable
Solution Approach 2:
The recess structure creates localized regions with favorable properties for diamond formation. By concentrating the nucleation sites in the recess regions, the process becomes more controllable and repeatable, as diamond formation is confined to specific geometric features rather than requiring uniform intermediate layer coverage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the stable and efficient direct formation of diamond on the substrate surface, improving production efficiency and quality by forming diamond in the edge regions and main surfaces of the substrate without the need for additional intermediate layers.
Implementation Method 1
an electrode part capable of generating plasma in the raw material liquid
Implementation Method 2
in-liquid plasma chemical vapor deposition method in which plasma is generated in a liquid using high frequencies, microwaves, or the like
Data Source
AI summary
An embodiment of the present invention provides a diamond formation device comprising: a reaction vessel in which a raw material liquid containing a carbon source is held and a substrate is placed in the raw material liquid; and an electrode part capable of generating plasma in the raw material liquid, wherein the substrate has at least one recess on a main surface on a side facing the electrode part. In addition, an embodiment of the present invention also provides a diamond-coated substrate comprising: a substrate having at least one recess on a main surface; and diamond directly formed on the main surface of the substrate.