Die-Level WAT Prediction for Wafer Testing Yield Analysis

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Solution Overview

Problem

Conventional wafer-level Wafer Acceptance Test (WAT) methods are limited by small sample sizes, leading to inaccurate and incomplete AI analysis, and struggle to address non-uniform defect distributions and the trade-off between System Level Test (SLT) yield and chip performance.

Innovation Solution

A machine learning-based system that collects actual WAT measurement parameters from multiple locations on a wafer and uses sensors within the wafer to predict die-level WAT parameters, employing a two-stage framework for enhanced analysis, including die-level WAT data prediction and key factor identification.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If wafer-level WAT data is used for AI analysis, then the analysis can be performed with existing testing infrastructure, but the sample amount is limited and accuracy is reduced

Engineering Contradiction:
ImproveAI analysis accuracyVSAvoidsample amount
Core Design Contradiction:
Measurement precisionVSQuantity of substance

Solution Approach 1:

The patent segments the wafer-level WAT data into die-level measurements by dividing the wafer into multiple measurement locations (e.g., 9 locations). Each location provides independent WAT data for multiple dies, transforming the data structure from wafer-level aggregates to die-level individual measurements. This segmentation increases the effective sample amount from 2000 wafer-level samples to potentially thousands of die-level samples while maintaining measurement precision through location-specific analysis.

Inventive Principle:
Principle #1Segmentation

2Productivity

If device speed is adjusted to increase SLT yield, then SLT yield improves, but chip performance decreases

Engineering Contradiction:
ImproveSLT yieldVSAvoidchip performance
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent applies local quality by analyzing WAT parameters at specific measurement locations on the wafer and identifying location-specific trends. By determining which locations have higher defect rates or performance characteristics, the system can target process adjustments to specific regions rather than applying uniform changes across the entire wafer. This allows optimization of SLT yield at locations where it is most needed while preserving chip performance at locations where speed adjustments would be most harmful.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS20260023908A1Machine Learning-based Wafer Testing Yield Boosting Method and System Capable of Predicting Die-level Wafer Acceptance Test Parameters
Publication Date: 2026.01.22 MEDIATEK INC
  • US20260023908A1 patent drawing
  • US20260023908A1 patent drawing
  • US20260023908A1 patent drawing

AI summary

A machine learning-based wafer testing yield boosting method includes acquiring a plurality of actual Wafer Acceptance Test (WAT) measurement parameters at a plurality of locations on a wafer from a foundry and a plurality of WAT sensing parameters monitored by a plurality of sensors disposed within the wafer, and inferring a plurality of predicted WAT parameters for a plurality of dies on the wafer based on the plurality of actual WAT measurement parameters and the plurality of WAT sensing parameters by a machine learning model.