Dielectric Barrier Discharge Plasma Generator for Uniform Ejection
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Solution Overview
Problem
Existing plasma generators face challenges in uniformly ejecting plasma from the entire outlet area, leading to uneven treatment on objects, and microwave-based generators suffer from non-uniform plasma density and difficulty in extending the device length.
Innovation Solution
A dielectric barrier discharge plasma generator with a specific electrode and substrate configuration that satisfies certain angle and permittivity conditions, enhancing electric field intensity near the outlet to efficiently generate and eject plasma uniformly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the electrodes are disposed with constant dielectric thickness throughout, then the device structure is simple, but the plasma ejection becomes non-uniform
Solution Approach 1:
The dielectric substrate thickness is varied locally to create different electric field intensities at different positions. The first dielectric substrate has a first thickness at the first end and a second thickness at the second end, while the second dielectric substrate has a third thickness at the first end and a fourth thickness at the second end. This local variation in thickness allows for uniform plasma ejection across the entire outlet area by optimizing the electric field distribution in different regions.
Solution Approach 2:
The patent changes the physical parameter of dielectric substrate thickness along the length of the electrodes. By setting specific thickness relationships (first thickness ≠ second thickness, third thickness ≠ fourth thickness) and satisfying the angle condition, the electric field intensity is optimized at each position to achieve uniform plasma generation and ejection across the outlet.
2Manufacturing precision
If the dielectric substrate thickness is varied to achieve uniform plasma ejection, then the plasma ejection uniformity is improved, but the device complexity increases
Solution Approach 1:
The dielectric barrier discharge plasma generator is divided into two distinct dielectric substrates (first dielectric substrate and second dielectric substrate) with different thickness profiles. Each substrate is configured with specific thickness relationships at different ends, allowing the complex uniform plasma ejection requirement to be met through modular segmentation of the dielectric structure.
Solution Approach 2:
The patent employs asymmetric thickness configurations where the first dielectric substrate has non-uniform thickness (first thickness at first end, second thickness at second end) and the second dielectric substrate has different non-uniform thickness (third thickness at first end, fourth thickness at second end). This asymmetric design optimizes the electric field distribution to achieve uniform plasma ejection while managing device complexity through structured asymmetry.
3Quantity of substance
If microwave-based plasma generation is used, then the plasma density is high, but the plasma density becomes non-uniform and device extension is difficult
Solution Approach 1:
The patent replaces the microwave-based electromagnetic field system with a dielectric barrier discharge system using controlled electric fields and gas flow. By using DC or AC voltage across dielectric substrates with specific thickness profiles, the system achieves plasma generation through a different physical mechanism that inherently provides more uniform plasma density distribution across the outlet area.
Data Source
AI summary
The dielectric barrier discharge plasma generator includes: a dielectric substrate that exhibits a plate shape extending in a first direction and has a first surface and a second surface located on an opposite side of the first surface in a second direction orthogonal to the first direction; a first electrode disposed on the dielectric substrate on a side of the first surface; a second electrode disposed at a position separated from the second surface of the dielectric substrate in the second direction; a gas flow path that is formed by a gap between the dielectric substrate and the second electrode and through which a gas flows in a third direction orthogonal to the first direction and the second direction; and an outlet provided at a first end which is one end portion of the gas flow path in the third direction.