Optical Device Layer Transfer for Regular Crystal Orientation
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Solution Overview
Problem
Existing manufacturing methods for optical devices, such as spectral chips, result in silicon crystals or silicides with irregular crystal orientations, leading to poor optical performance due to low light transmittance and refractive index, which fail to meet preset requirements.
Innovation Solution
A manufacturing method involving a transferring member with a target transferring layer of regular crystal orientation is used to bond and retain a silicon crystal or silicide layer onto the optical device, forming a light-transmissive dielectric layer and using chemical mechanical polishing to ensure a flat surface for stable bonding.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If vapor deposition method is used to form silicon crystal on optical device, then manufacturing process is simple and suitable for surface deposition, but crystal orientation regularity is poor and light transmittance is low
Solution Approach 1:
The patent introduces an intermediary transferring member that carries a silicon crystal layer with regular crystal orientation. This mediator enables the transfer of high-quality crystalline structure to the optical device surface without requiring direct vapor deposition, thus resolving the contradiction between manufacturing simplicity and crystal quality.
Solution Approach 2:
The patent creates a copy of the high-quality silicon crystal layer from the transferring member and bonds it to the optical device. This copying approach allows the optical device to acquire the regular crystal orientation structure without undergoing the complex vapor deposition process, achieving both manufacturing ease and high crystal quality.
2Ease of manufacture
If vapor deposition method is used to form silicon crystal, then deposition process is straightforward, but refractive index and modulation effect are insufficient
Solution Approach 1:
The transferring member serves as an intermediary that pre-forms the silicon crystal layer with optimal crystal orientation and optical properties. This mediator approach ensures high refractive index and good modulation effect while keeping the overall process simple, resolving the contradiction between deposition simplicity and optical performance.
Solution Approach 2:
The patent performs preliminary formation of the high-quality silicon crystal layer on the transferring member before transferring it to the optical device. This preliminary action ensures that the crystal layer has the required refractive index and modulation characteristics before being applied to the final device, guaranteeing optical reliability.
3Manufacturing precision
If Czochralski method or floating zone melting method is used, then crystal orientation regularity is high, but these methods are not suitable for forming silicon crystal on optical device surface
Solution Approach 1:
The patent segments the crystal formation process from the device integration process. The silicon crystal layer is formed separately on the transferring member using Czochralski or floating zone melting methods to achieve high crystal orientation regularity, then transferred to the optical device surface, combining the advantages of both approaches.
Solution Approach 2:
The transferring member acts as an intermediary that enables the use of complex crystal growth methods (Czochralski or floating zone melting) without directly applying them to the optical device surface. This mediator approach achieves high crystal orientation regularity while maintaining process suitability for surface deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves an optical layer structure with better crystal orientation, enhancing the optical device's performance by improving transmittance and refractive index, thereby meeting application requirements.
Implementation Method 1
coupling the transferring member to the optical device to be transferred in such a way that the target transferring layer of the transferring member is bonded to the light-transmissive dielectric layer of the optical device to be transferred
Implementation Method 2
using chemical mechanical polishing to ensure a flat surface for stable bonding
Data Source
AI summary
Disclosed are a manufacturing method for an optical device, and the optical device. The manufacturing method includes: providing a transferring member and an optical device to be transferred, wherein the transferring member includes a target transferring layer having a regular crystal orientation structure; forming a light-transmissive dielectric layer on a surface of the optical device to be transferred; coupling the transferring member to the optical device to be transferred in such a way of bonding the target transferring layer of the transferring member to the light-transmissive dielectric layer of the optical device to be transferred; and retaining at least part of the target transferring layer of the transferring member to form the optical device. Therefore, the surface of the optical device manufactured in the foregoing specific manufacturing method can form an optical layer structure having the regular crystal orientation structure.