Dielectric Barrier Discharge Chamber for Open-Air Implant Activation

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Solution Overview

Problem

Existing plasma treatment devices for hydrophilizing implants require specific packaging that is costly and limits their applicability to certain manufacturers, and the process is time-consuming due to the need for low-pressure chamber pumping and encapsulation.

Innovation Solution

A device utilizing a dielectric barrier discharge in an open working chamber with a metallization layer on a dielectric wall, allowing plasma treatment without encapsulation, at atmospheric pressure, and enabling rapid treatment of implants by direct plasma ignition on the surface, using a piezoelectric transformer for high voltage application.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a sealed container or package is used for plasma treatment, then the plasma process can be performed, but the device complexity and manufacturing cost increase significantly

Engineering Contradiction:
Improveplasma treatment effectivenessVSAvoidpackaging requirements
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent extracts the plasma treatment process from the sealed container environment and applies it directly to the implant surface in an open system. The dielectric barrier discharge is generated between the implant and a dielectric surface, eliminating the need for complex sealed packaging while maintaining plasma treatment effectiveness.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces a dielectric barrier (such as a plastic wrap or dielectric layer) as an intermediary between the plasma source and the implant. This dielectric barrier enables plasma generation through dielectric barrier discharge, allowing effective surface treatment without requiring hermetically sealed containers.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If low-pressure chamber pumping is used for plasma treatment, then plasma can be generated, but the treatment time increases

Engineering Contradiction:
Improveplasma generationVSAvoidtreatment time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent changes the pressure parameter from vacuum/low-pressure conditions to atmospheric pressure operation. By using dielectric barrier discharge, plasma can be generated effectively at atmospheric pressure, eliminating the time-consuming vacuum pumping step while maintaining reliable plasma generation for surface treatment.

Inventive Principle:
Principle #35Parameter changes

3Reliability

If specific packaging is required for plasma treatment, then the process can be performed, but the adaptability to different implants is limited

Engineering Contradiction:
Improveplasma process compatibilityVSAvoidimplant compatibility
Core Design Contradiction:
ReliabilityVSAdaptability or versatility

Solution Approach 1:

The patent creates a universal plasma treatment system that can treat any implant surface regardless of the implant type or manufacturer. The dielectric barrier discharge method works with various implant materials and geometries, and the process can be performed on implants whether they are packaged or unpackaged, making the system broadly applicable across different medical devices.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables universal applicability to any implant, reduces treatment time to less than 90 seconds, avoids encapsulation requirements, and allows integration into medical workflows without intermediate storage, ensuring hydrophilic surfaces for improved healing and osseointegration.

Implementation Method 1

Device for generating a dielectric barrier discharge for treatment of an object to be activated with non-thermal atmospheric pressure plasma

Methodology Applied
Scientific EffectDielectric barrier discharge: Plasma

Implementation Method 2

using a piezoelectric transformer for high voltage application

Methodology Applied
Scientific EffectPiezoelectric effect: Piezoelectric Effect

Data Source

PatentUS12463024B2Device for generating a dielectric barrier discharge and method for treating an object to be activated
Publication Date: 2025.11.04 TDK ELECTRONICS AG
  • US12463024B2 patent drawing
  • US12463024B2 patent drawing
  • US12463024B2 patent drawing

AI summary

The present invention relates to a device for generating a dielectric barrier discharge for treatment of an object to be activated with non-thermal atmospheric pressure plasma, comprising a dielectric working chamber which has a wall of a dielectric material and which encloses a working space, wherein a metallization is applied to an outer side of the wall facing away from the working space, wherein the working space is an open volume, and a high-voltage source which is configured to apply a high voltage to the metallization or to the object to be activated when the object to be activated is in the working space. According to a further aspect, the invention relates to a method of treatment of an object to be activated with a non-thermal atmospheric pressure plasma.